Paper
14 December 2009 FAST-LH: a manufacturing-environmental friendly method of lens heating monitoring
Siew Ing Yet, Faith Lim
Author Affiliations +
Proceedings Volume 7520, Lithography Asia 2009; 75202J (2009) https://doi.org/10.1117/12.836991
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
Abstract
Lens heating monitoring is crucial for photolithography process control; ineffective lens heating compensation will cause severe focus and image drift on photoresist pattern. Conventional/standard lens heat-test recommended by equipment vendor normally requires long measuring time which is not manufacturing-environmental friendly, and it is designed more to equipment perspective. A fast and accurate method of lens heating monitoring (FAST-LH) is discussed in this paper. Focus drift induced by lens heating is measured using both conventional and FAST-LH; result comparison shows strong correlation of focus drift with the new measuring method. Detailed methodology for the lens heating monitoring is studied; a fine tuned new measuring method is proven to be not only fast but also accurate to monitor lens heating LC compensation rate. Compared to the conventional method, FAST-LH could reflect better the actual focus drift under manufacturing environment. Due to the limitation of transforming the FAST-LH to equipment LH compensation settings, the FASTLH is implemented for periodic monitoring and feedback; whereas the conventional method is used during compensation/corrective action.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Siew Ing Yet and Faith Lim "FAST-LH: a manufacturing-environmental friendly method of lens heating monitoring", Proc. SPIE 7520, Lithography Asia 2009, 75202J (14 December 2009); https://doi.org/10.1117/12.836991
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Cited by 1 scholarly publication.
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KEYWORDS
Calibration

Manufacturing

HVAC controls

Reticles

Control systems

Semiconducting wafers

Absorption

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