50 keV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5-nm sized beams

Christof Klein; Jan Klikovits; Laszlo Szikszai; Elmar Platzgummer; Hans Loeschner

doi:10.1117/12.846544

1 April 2010 50 keV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5-nm sized beams

Christof Klein, Jan Klikovits, Laszlo Szikszai, Elmar Platzgummer, Hans Loeschner

Author Affiliations +

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76370B (2010) https://doi.org/10.1117/12.846544
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Projection Mask-Less Lithography (PML2) is a potentially cost-effective electron multi-beam solution for the 16 nm hp ITRS technology node and beyond. First results obtained with a PML2 Testbench are presented where a programmable Aperture Plate System (APS) was used to generate ca. 2500 micrometer-sized beams which are projected onto wafer level with 200x demagnification. The APS contains CMOS electronics which allows for addressable deflection of selected beams; only non-deflected beams make it to the wafer surface to achieve 12.5 nm spot size. Beam energy (50keV) and current density (~2 A/cm²) are the same as in future PML2 production tools. Thus, the results obtained with the PML2 Testbench unambiguously prove the patterning capabilities of the PML2 technology.

Citation Download Citation

Christof Klein, Jan Klikovits, Laszlo Szikszai, Elmar Platzgummer, and Hans Loeschner "50 keV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5-nm sized beams", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370B (1 April 2010); https://doi.org/10.1117/12.846544

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