Monitor and self-diagnostic technology for mask e-beam writing system

N. Samoto; H. Manabe; O. Wakimoto; S. Iida; H. Hoshi; M. Yamabe

doi:10.1117/12.846266

2 April 2010 Monitor and self-diagnostic technology for mask e-beam writing system

N. Samoto, H. Manabe, O. Wakimoto, S. Iida, H. Hoshi, M. Yamabe

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76371K (2010) https://doi.org/10.1117/12.846266
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The accuracy of image placement and linewidth on masks has become very crucial to the point that even minor variations in exposure parameters require re-works and result in increasing mask cost. In 2006, at the Association of Super-Advanced Electronics Technologies (ASET), Mask Design, Drawing and Inspection technology Research Department (Mask D2I) had launched a 4-year development program for the optimization of mask design, drawing, and inspection to reduce photomask manufacturing cost. An outline of a system to monitor and self-diagnose the process of data transfer, magnetic field change, and vibration during exposure is described here.

Citation Download Citation

N. Samoto, H. Manabe, O. Wakimoto, S. Iida, H. Hoshi, and M. Yamabe "Monitor and self-diagnostic technology for mask e-beam writing system", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371K (2 April 2010); https://doi.org/10.1117/12.846266

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