Metrology and process control: dealing with measurement uncertainty

James Potzick

doi:10.1117/12.851008

1 April 2010 Metrology and process control: dealing with measurement uncertainty

James Potzick

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 76381U (2010) https://doi.org/10.1117/12.851008
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Metrology is often used in designing and controlling manufacturing processes. A product sample is processed, some relevant property is measured, and the process adjusted to bring the next processed sample closer to its specification. This feedback loop can be remarkably effective for the complex processes used in semiconductor manufacturing, but there is some risk involved because measurements have uncertainty and product specifications have tolerances. There is finite risk that good product will fail testing or that faulty product will pass. Standard methods for quantifying measurement uncertainty have been presented, but the question arises: how much measurement uncertainty is tolerable in a specific case? Or, How does measurement uncertainty relate to manufacturing risk? This paper looks at some of the components inside this process control feedback loop and describes methods to answer these questions.

Citation Download Citation

James Potzick "Metrology and process control: dealing with measurement uncertainty", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381U (1 April 2010); https://doi.org/10.1117/12.851008

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