Molecular glass positive i-line photoresist materials containing 2,1,4-DNQ and acid labile group

Liyuan Wang; Jinxing Yu; Na Xu

doi:10.1117/12.847019

30 March 2010 Molecular glass positive i-line photoresist materials containing 2,1,4-DNQ and acid labile group

Liyuan Wang, Jinxing Yu, Na Xu

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76392D (2010) https://doi.org/10.1117/12.847019
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Recent years increasing attention has been given to molecular glass resist materials. In this paper, maleopimaric acid, cycloaddition reaction product of rosin with maleic anhydride, was reacted with hydroxylamine and then further esterified with 2-diazo-1-naphthoquinone-4-sulfonyl chloride to give N-hydroxy maleopimarimide sulfonate. The carboxylic acid group of the compound was then protected by the reaction of this compound with vinyl ethyl ether or dihydropyran. Thus obtained compounds were amorphous. When irradiated with i-line light, the 2,1,4-DNQ group undergo photolysis not only to give off nitrogen gas but also generate sulfonic acid which can result in the decomposition of the acid labile group. So, a novel chemically amplified positive i-line molecular glass photoresists can be formed by the compound and other acidolytic molecular glass compounds. The lithographic performance of the resist materials is evaluated.

Citation Download Citation

Liyuan Wang, Jinxing Yu, and Na Xu "Molecular glass positive i-line photoresist materials containing 2,1,4-DNQ and acid labile group", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392D (30 March 2010); https://doi.org/10.1117/12.847019

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