Effect of temperature on the growth of vanadium oxide films deposited by DC reactive magnetron sputtering

Mingjun Du; Zhiming Wu; Zhenfei Luo; Xiangdong Xu; Junsheng Yu; Yadong Jiang

doi:10.1117/12.865558

22 October 2010 Effect of temperature on the growth of vanadium oxide films deposited by DC reactive magnetron sputtering

Mingjun Du, Zhiming Wu, Zhenfei Luo, Xiangdong Xu, Junsheng Yu, Yadong Jiang

Author Affiliations +

Proceedings Volume 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology; 76581Z (2010) https://doi.org/10.1117/12.865558
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

Vanadium oxide films were prepared onto glass and KBr substrates at various deposition temperatures by DC reactive magnetron sputtering. X-Ray photoelectron spectroscopy (XPS), Atomic force microscope (AFM), Fourier transform infrared spectroscopy (FT-IR) were employed to analyze the VOx films, respectively. Experimental results indicated that deposition temperature has a great impact on the surface morphology of vanadium oxide films. The XPS analysis confirmed that the vanadium oxide films prepared are V₂O₅. From Fourier transform infrared spectroscopy, it can be see that the infrared active mode corresponding to V-O-V stretching vibration and the stretching vibration of unshared V=O bonds appeared at about 840 cm^-1 and 915 cm^-1 in the films formed at 240 , respectively. A shift in the peak position towards higher frequency was found with increasing the deposition temperature which indicated that the films formed at higher deposition temperature were structural disorder.

Citation Download Citation

Mingjun Du, Zhiming Wu, Zhenfei Luo, Xiangdong Xu, Junsheng Yu, and Yadong Jiang "Effect of temperature on the growth of vanadium oxide films deposited by DC reactive magnetron sputtering", Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 76581Z (22 October 2010); https://doi.org/10.1117/12.865558

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Vanadium

Oxides

Sputter deposition

FT-IR spectroscopy

Image sensors

Optical testing

Optics manufacturing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years