Front Matter: Volume 7972
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797201 (2011) https://doi.org/10.1117/12.899317
Invited Session
Patrick P. Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth A. Goldberg, Gideon Jones, Brittany McClinton, Ryan Miyakawa, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797202 (2011) https://doi.org/10.1117/12.882955
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797204 (2011) https://doi.org/10.1117/12.882958
Novel Processing Special Topic: Negative-Tone Development I
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797205 (2011) https://doi.org/10.1117/12.882959
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797206 (2011) https://doi.org/10.1117/12.882843
Young C. Bae, Seung-Hyun Lee, Rosemary Bell, Lori Joesten, George G. Barclay
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797207 (2011) https://doi.org/10.1117/12.882141
EUV I: Joint Session with Conference 7969
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797208 (2011) https://doi.org/10.1117/12.881215
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797209 (2011) https://doi.org/10.1117/12.879302
Hiroshi Tamaoki, Shinji Tarutani, Hideaki Tsubaki, Toshiya Takahashi, Naoki Inoue, Tooru Tsuchihashi, Hiroo Takizawa, Hidenori Takahashi
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720A (2011) https://doi.org/10.1117/12.879394
Pitch Reduction and Double Patterning
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720B (2011) https://doi.org/10.1117/12.878943
Koutarou Sho, Tomoya Oori, Kazunori Iida, Katsutoshi Kobayashi, Keisuke Kikutani, Katsumi Yamamoto, Fumiki Aiso, Kentaro Matsunaga, Eishi Shiobara, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720C (2011) https://doi.org/10.1117/12.877616
Dennis Shu-Hao Hsu, Walter Wang, Wei-Hsien Hsieh, Chun-Yen Huang, Wen-Bin Wu, Chiang-Lin Shih, Steven Shih
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720D (2011) https://doi.org/10.1117/12.879374
Zishu Zhang, Kaveri Jain, Scott L. Light, Anton J. deVilliers
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720E (2011) https://doi.org/10.1117/12.881552
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720F (2011) https://doi.org/10.1117/12.879861
Steven J. Holmes, Cherry Tang, Sean Burns, Yunpeng Yin, Rex Chen, Chiew-seng Koay, Sumanth Kini, Hideyuki Tomizawa, Shyng-Tsong Chen, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720G (2011) https://doi.org/10.1117/12.881489
Resist Fundamentals
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720H (2011) https://doi.org/10.1117/12.878670
Linda K. Sundberg, Gregory M. Wallraff, Alexander M. Friz, Blake W. Davis, Sally A. Swanson, Phillip J. Brock, Charles T. Rettner, William D. Hinsberg
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720I (2011) https://doi.org/10.1117/12.882185
Kenji Yoshimoto, Craig Higgins, Ananthan Raghunathan, John G. Hartley, Dario L. Goldfarb, Hirokazu Kato, Karen Petrillo, Matthew E. Colburn, Jeffrey Schefske, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720K (2011) https://doi.org/10.1117/12.880180
Jun Iwashita, Taku Hirayama, Isamu Takagi, Kensuke Matsuzawa, Kenta Suzuki, Sachiko Yoshizawa, Kenri Konno, Masahito Yahagi, Kazufumi Sato, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720L (2011) https://doi.org/10.1117/12.879349
Novel Processing Special Topic: Negative-Tone Development II
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720M (2011) https://doi.org/10.1117/12.879719
Shinji Tarutani, Sou Kamimura, Kana Fujii, Keita Katou, Yuuichirou Enomoto
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720N (2011) https://doi.org/10.1117/12.879391
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720O (2011) https://doi.org/10.1117/12.879294
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720P (2011) https://doi.org/10.1117/12.880906
Douglas J. Guerrero, Vandana Krishnamurthy, Daniel M. Sullivan
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720Q (2011) https://doi.org/10.1117/12.881508
Directed Self-Assembly I: Selected Semiconductor Applications: Joint Session with Conference 7970
Michael T. Sheehan, William B. Farnham, Charles R. Chambers, Hoang V. Tran, Hiroshi Okazaki, Yefim Brun, Matthew L. Romberger, James R. Sounik
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720T (2011) https://doi.org/10.1117/12.882960
Simulation of Lithographic Phenomena
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720U (2011) https://doi.org/10.1117/12.879331
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720V (2011) https://doi.org/10.1117/12.879831
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720W (2011) https://doi.org/10.1117/12.879587
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720Y (2011) https://doi.org/10.1117/12.879506
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79720Z (2011) https://doi.org/10.1117/12.880980
EUV II: Joint Session with Conference 7969
Tomoko G. Oyama, Tomohiro Takahashi, Akihiro Oshima, Masakazu Washio, Seiichi Tagawa
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797210 (2011) https://doi.org/10.1117/12.881665
Craig Higgins, Charles Settens, Patricia Wolfe, Karen Petrillo, Robert Auger, Richard Matyi, Robert Brainard
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797211 (2011) https://doi.org/10.1117/12.879509
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797212 (2011) https://doi.org/10.1117/12.881639
Novel Materials and Processing I
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797213 (2011) https://doi.org/10.1117/12.881433
James Cameron, Jin Wuk Sung, Sabrina Wong, Adam Ware, Yoshihiro Yamamoto, Hiroaki Kitaguchi, Libor Vyklicky, Steve Holmes, Irene Popova, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797214 (2011) https://doi.org/10.1117/12.881614
Raluca Tiron, Erwine Pargon, Laurent Azarnouche, Herve Fontaine, Sylviane Cetre, Claire Sourd
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797215 (2011) https://doi.org/10.1117/12.879390
Martin Glodde, Sebastian Engelmann, Michael Guillorn, Sivananda Kanakasabapathy, Erin Mclellan, Chiew-Seng Koay, Yunpeng Yin, Muthumanickam Sankarapandian, John C. Arnold, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797216 (2011) https://doi.org/10.1117/12.879442
Kazumasa Okamoto, Takahiro Kozawa, Takaki Hatsui, Yasuharu Tajima, Keita Oikawa, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797217 (2011) https://doi.org/10.1117/12.879358
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797218 (2011) https://doi.org/10.1117/12.884519
Novel Materials and Processing II
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797219 (2011) https://doi.org/10.1117/12.879288
Qinghuang Lin, A. Nelson, L. Bozano, P. Brock, S. Cohen, B. Davis, R. Kwong, E. Liniger, D. Neumayer, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721A (2011) https://doi.org/10.1117/12.881571
Meng-Feng Tsai, Yang-Liang Li, Chan-Tsun Wu, Yi-Shiang Chang, Chia-Chi Lin
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721B (2011) https://doi.org/10.1117/12.879316
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721C (2011) https://doi.org/10.1117/12.879385
Poster Session: EUV
Masamitsu Shirai, Koichi Maki, Haruyuki Okamura, Koji Kaneyama, Toshiro Itani
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721E (2011) https://doi.org/10.1117/12.879037
Tsuneo Yamashita, Masamichi Morita, Yoshito Tanaka, Julius Joseph Santillan, Toshiro Itani
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721G (2011) https://doi.org/10.1117/12.879568
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721H (2011) https://doi.org/10.1117/12.879412
Hiroki Nakagawa, Tomohisa Fujisawa, Kentaro Goto, Tooru Kimura, Toshiyuki Kai, Yoshi Hishiro
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721I (2011) https://doi.org/10.1117/12.879303
M. Endo, S. Tagawa
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721J (2011) https://doi.org/10.1117/12.878942
Poster Session: Negative Tone
Junggun Heo, Changil Oh, Junghyung Lee, Minkyung Park, Hyungsuk Seo, Cheolkyu Bok, Donggyu Yim, Sungki Park
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721K (2011) https://doi.org/10.1117/12.871048
Medhat Toukhy, Margareta Paunescu, Chunwei Chen
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721L (2011) https://doi.org/10.1117/12.882072
Poster Session: Resist Fundamentals
Michael Hyatt, Anton DeVilliers, Kaveri Jain
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721M (2011) https://doi.org/10.1117/12.881597
Y. Tajima, K. Okamoto, T. Kozawa, S. Tagawa, R. Fujiyoshi, T. Sumiyoshi
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721N (2011) https://doi.org/10.1117/12.879362
Masamitsu Shirai, Tatsuya Hatsuse, Haruyuki Okamura, Shigeo Kimura, Yasuyuki Nakajima
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721O (2011) https://doi.org/10.1117/12.879039
Lijing Gou, Vinay Nair, Hiroyuki Mori, Adam Olson, David Swindler, Anton Devilliers
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721P (2011) https://doi.org/10.1117/12.881546
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721Q (2011) https://doi.org/10.1117/12.879581
Cuimei Diao, Yingquan Zou
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721R (2011) https://doi.org/10.1117/12.879382
Atsushi Sekiguchi, Yoko Matsumoto, Hiroko Konishi, Kengo Moriyasu, Yukihiro Morimoto
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721S (2011) https://doi.org/10.1117/12.879199
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721U (2011) https://doi.org/10.1117/12.879421
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721W (2011) https://doi.org/10.1117/12.894705
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721X (2011) https://doi.org/10.1117/12.895112
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721Y (2011) https://doi.org/10.1117/12.895114
Poster Session: Novel Materials
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79721Z (2011) https://doi.org/10.1117/12.881735
Younjin Cho, Xinyu Gu, Yuji Hagiwara, Takanori Kawakami, Toshiyuki Ogata, Brandon Rawlings, Yongjun Li, Arun K. Sundaresan, Nicholas J. Turro, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797221 (2011) https://doi.org/10.1117/12.879771
Masaaki Takasuka, Yu Okada, Hiromi Hayashi, Masatoshi Echigo
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797223 (2011) https://doi.org/10.1117/12.879122
Makoto Nakajima, Yuta Kanno, Wataru Shibayama, Satoshi Takeda, Masakazu Kato, Takashi Matsumoto
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797225 (2011) https://doi.org/10.1117/12.879357
Makoto Muramatsu, Mitsuaki Iwashita, Takashi Kondo, Hisashi Hirose, Seiji Fujimoto
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797226 (2011) https://doi.org/10.1117/12.878863
Joyce Lowes, Alice Guerrero, Michael Weigand, Carlton Washburn, Charlyn Stroud, Shalini Sharma, David Torres, Mark Slezak, Gary Dabbagh, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797227 (2011) https://doi.org/10.1117/12.879464
Wen-Yun Wang, Chen-Yu Liu, Tsung-Chih Chien, Chun-Ching Huang, Shy-Jay Lin, Ya-Hui Chang, Jack J.H. Chen, Ching-Yu Chang, Yao-Ching Ku, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797228 (2011) https://doi.org/10.1117/12.879575
Satoshi Takei, Akihiro Oshima, Naomi Yanamori, Atsushi Sekiguchi, Takahiro Kozawa, Seiichi Tagawa
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797229 (2011) https://doi.org/10.1117/12.878451
Youngjin Cho, Christine Y. Ouyang, Marie Krysak, Wenjie Sun, Victor Gamez, Reyes Sierra-Alvarez, Christopher K. Ober
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722A (2011) https://doi.org/10.1117/12.879816
Yuan Fang, Yingquan Zou
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722B (2011) https://doi.org/10.1117/12.879295
Satoshi Takei, Tsuyoshi Ogawa
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722C (2011) https://doi.org/10.1117/12.881495
Dongfang Guo, Juan Liu, Liyuan Wang
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722D (2011) https://doi.org/10.1117/12.879296
Yong Keng Goh, Lan Chen, Anneke Dorgelo, Xie Peng, Neal Lafferty, Bruce Smith, Paul Zimmerman, Warren Montgomery, Idriss Blakey, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722E (2011) https://doi.org/10.1117/12.881700
D. Bourrier, M. Dilhan, A. Ghannam, H. Granier
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722F (2011) https://doi.org/10.1117/12.870496
Michael Swope, Vandana Krishnamurthy, Zhimin Zhu, Daniel Sullivan, Sean Simmons, Chris Cox, Randy Bennett, Cheryl Nesbit
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722H (2011) https://doi.org/10.1117/12.879462
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722I (2011) https://doi.org/10.1117/12.894702
Poster Session: Novel Processes
Scott A. Ostrow II, Jack P. Lombardi III, Ronald A. Coutu Jr.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722J (2011) https://doi.org/10.1117/12.881653
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722K (2011) https://doi.org/10.1117/12.871114
Yayi Wei, Martin Glodde, Hakeem Yusuff, Margaret Lawson, Sang Yil Chang, Kwang Sub Yoon, Chung-Hsi Wu, Mark Kelling
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722L (2011) https://doi.org/10.1117/12.879301
Masashi Nakao, Masanori Yamaguchi, Shintaro Yabu
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722M (2011) https://doi.org/10.1117/12.879397
J. Manyam, M. Manickam, J. A. Preece, R. E. Palmer, A. P. G. Robinson
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722N (2011) https://doi.org/10.1117/12.879469
Michael Reilly, James F. Cameron, Sabrina Wong, Adam Ware
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722O (2011) https://doi.org/10.1117/12.880982
Wei-Su Chen, Ming-Jinn Tsai
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722P (2011) https://doi.org/10.1117/12.878591
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722Q (2011) https://doi.org/10.1117/12.878947
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722S (2011) https://doi.org/10.1117/12.881675
J. M. Gomez, I. Y. Popova, B. Zhang, H. Kry, S. J. Holmes, S. Nakagawa, T. Murakami, Chan Sam Chang, Cheol Kim
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722T (2011) https://doi.org/10.1117/12.879866
Donald W. Johnson, Jost Goettert, Varshni Singh, Dawit Yemane
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722U (2011) https://doi.org/10.1117/12.882872
Wei-Su Chen, Ming-Jinn Tsai
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722V (2011) https://doi.org/10.1117/12.878590
Poster Session: Manufacturing
Yong-Hyun Lim, Jae-Doo Eom, Woo-Yung Jung, Min-Sik Jang, Byung-Seok Lee, Jin-Woong Kim
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722W (2011) https://doi.org/10.1117/12.869936
M. Enomoto, T. Shimoaoki, K. Nafus, N. Nakashima, K. Tsutsumi, H. Marumoto, H. Kosugi, P. Derwin, R. Maas, et al.
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722X (2011) https://doi.org/10.1117/12.879380
J. Braggin, N. Vitorino, V. Monreal, J. Zook
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722Y (2011) https://doi.org/10.1117/12.879457
Nick Brakensiek, Jennifer Braggin, John Berron, Raul Ramirez, Karl Anderson, Brian Smith
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 79722Z (2011) https://doi.org/10.1117/12.879481
Yusuke Yamamoto, Kouzo Nishi, Koji Takayanagi, Takahiro Okubo, Toshinobu Furusho, Kosuke Yoshihara, Tsuyoshi Shibata
Proceedings Volume Advances in Resist Materials and Processing Technology XXVIII, 797230 (2011) https://doi.org/10.1117/12.879339
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