Paper
20 September 1976 Mask Inspection - What's It Worth to You?
Mel Wright
Author Affiliations +
Abstract
How many times have you discussed the need for increased I.C. complexity, C.D.'s with tighter tolerances, submicron C.D.'s, zero defects, larger dies . . . ? Since each one of these needs will require additional mask inspection effort, I suggest that you should ask, "What is it worth to you and when does the cost of mask inspection approach the critical point of a depreciating return on investment (i.e. tooling cost versus die yield)?". It has been my experience that approximately one half of the labor used to fabricate masks is devoted to mask inspection. A survey of mask fabricators and mask users indicated the following ranking, in order of importance, of four mask quality parameters: (1) pattern registration (2) critical dimensions (measured with precision) (3) fatal defects (4) critical dimensions (measured with accuracy)
© (1976) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mel Wright "Mask Inspection - What's It Worth to You?", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954848
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KEYWORDS
Photomasks

Inspection

Semiconducting wafers

Standards development

Image registration

Precision measurement

Tolerancing

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