Structural and optical properties of LuFeO3 thin films prepared on silicon (100) substrate by pulsed laser deposition

Liping Zhu; Hongmei Deng; Jianjun Tian; Pingxiong Yang; Junhao Chu

doi:10.1117/12.914548

22 February 2012 Structural and optical properties of LuFeO₃ thin films prepared on silicon (100) substrate by pulsed laser deposition

Liping Zhu, Hongmei Deng, Jianjun Tian, Pingxiong Yang, Junhao Chu

Author Affiliations +

Proceedings Volume 8333, Photonics and Optoelectronics Meetings (POEM) 2011: Optoelectronic Devices and Integration; 83331F (2012) https://doi.org/10.1117/12.914548
Event: Photonics and Optoelectronics Meetings 2011, 2011, Wuhan, China

Abstract

The LuFeO₃ (LFO) nanocrystalline films with the average grain size of 20 nm have been grown on silicon (100) substrates by pulsed laser deposition. X-ray diffraction (XRD) analysis shows that LFO films are polycrystalline. The microstructure and surface morphology of LFO film are analyzed by Atomic force microscope (AFM) and the surface shows the film is compact. Spectroscopic ellipsometry (SE) was used to extract the optical properties of LFO films in the 1.1-3.1 eV (400-1100 nm) photon energy range at room temperature. By fitting the measured ellipsometric parameter data with a multilayer model system for the LFO thin films, the optical constants and thicknesses of the thin films have been obtained. The refractive index n and extinction coefficient k of the LFO thin films both decreases with increasing thickness.

Citation Download Citation

Liping Zhu, Hongmei Deng, Jianjun Tian, Pingxiong Yang, and Junhao Chu "Structural and optical properties of LuFeO₃ thin films prepared on silicon (100) substrate by pulsed laser deposition", Proc. SPIE 8333, Photonics and Optoelectronics Meetings (POEM) 2011: Optoelectronic Devices and Integration, 83331F (22 February 2012); https://doi.org/10.1117/12.914548

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