Research on method of measuring pattern distortion of circularly symmetrical phase etched CGHs and eliminating the effect of pattern distortion

Chao Deng; Jie Feng; Tingwen Xing

doi:10.1117/12.975793

15 October 2012 Research on method of measuring pattern distortion of circularly symmetrical phase etched CGHs and eliminating the effect of pattern distortion

Chao Deng, Jie Feng, Tingwen Xing

Author Affiliations +

Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 84180V (2012) https://doi.org/10.1117/12.975793
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Circularly symmetrical phase etched computer-generated hologram (CGH) are widely used to test aspheric surface. In CGH fabrication errors, pattern distortion errors not only strongly affect the test precision but also can’t be facilely eliminated. In order to improve the test accuracy of system, a moiré fringes method is described for testing circularly symmetrical pattern distortion. Compared with the conventional method of using microdensitometer, the new method is more accurate and quicker for measuring the pattern distortion. Then, based on the accurate measurement of CGH pattern distortion, the impact on test accuracy that pattern distortion brings is eliminated with synthetic wavefront error map. Finally, through computer simulating, it is proved that the new method can effectively reduce the impact on test accuracy that pattern distortion brings.

Citation Download Citation

Chao Deng, Jie Feng, and Tingwen Xing "Research on method of measuring pattern distortion of circularly symmetrical phase etched CGHs and eliminating the effect of pattern distortion", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180V (15 October 2012); https://doi.org/10.1117/12.975793

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KEYWORDS

Computer generated holography

Distortion

Moire patterns

Aspheric lenses

Wavefronts

Holography

Spatial frequencies

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