Multiple-order imaging for optical critical dimension metrology using microscope characterization

Jing Qin; Hui Zhou; Bryan M. Barnes; Francois Goasmat; Ronald Dixson; Richard M. Silver

doi:10.1117/12.946120

11 October 2012 Multiple-order imaging for optical critical dimension metrology using microscope characterization

Jing Qin, Hui Zhou, Bryan M. Barnes, Francois Goasmat, Ronald Dixson, Richard M. Silver

Author Affiliations +

Proceedings Volume 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI; 84660G (2012) https://doi.org/10.1117/12.946120
Event: SPIE NanoScience + Engineering, 2012, San Diego, California, United States

Abstract

There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previously reported quantitative measurements for sub-50 nm CD dense arrays which scatter only the 0th-order specular diffraction component using angle-resolved scatterfield microscopy. Through angle-resolved and focus-resolved imaging, we now measure OCD targets with three-dimensional scattered fields that contain multiple Fourier frequencies. Experimental sensitivity to nanometer scale linewidth changes is presented, supported by simulation studies. A new, more advanced approach to tool normalization is coupled with rigorous electromagnetic simulations and library based regression fitting that potentially enables OCD measurements with sub-nanometer uncertainties for targets that scatter multiple Fourier frequencies.

Citation Download Citation

Jing Qin, Hui Zhou, Bryan M. Barnes, Francois Goasmat, Ronald Dixson, and Richard M. Silver "Multiple-order imaging for optical critical dimension metrology using microscope characterization", Proc. SPIE 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI, 84660G (11 October 2012); https://doi.org/10.1117/12.946120

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
12 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Polarization

Critical dimension metrology

Microscopes

Illumination engineering

Light scattering

Optical imaging

Optical metrology

Show All Keywords

Keywords/Phrases

Search In:

Publication Years