Six production masks were measured on a standard registration metrology tool and the registration errors were calculated and plotted. Specially developed algorithm along with the RegC Wizard (dedicated software) was used to compute a correction lateral strain field that would minimize the registration errors. This strain field was then implemented in the photomask bulk material using an ultra short pulse laser based system. Finally the post process registration error maps were measured and the resulting residual registration error field with and without scale and orthogonal errors removal was calculated. In this paper we present a robust process flow in the mask shop which leads up to 32% registration 3sigma improvement, bringing some out-of-spec masks into spec, utilizing the RegC® process in the photomask periphery while leaving the exposure field optically unaffected. |
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CITATIONS
Cited by 4 patents.
Photomasks
Image registration
Scanners
Semiconducting wafers
Manufacturing
Metrology
Overlay metrology