RF plasma cleaning of mirror surfaces: characterization, optimization, and surface physics aspects of plasma cleaning

E. Pellegrin; I. Šics; C. Pérez Sempere; J. Reyes Herrera; V. Carlino

doi:10.1117/12.2019216

3 May 2013 RF plasma cleaning of mirror surfaces: characterization, optimization, and surface physics aspects of plasma cleaning

E. Pellegrin, I. Šics, C. Pérez Sempere, J. Reyes Herrera, V. Carlino

Author Affiliations +

Proceedings Volume 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III; 87770P (2013) https://doi.org/10.1117/12.2019216
Event: SPIE Optics + Optoelectronics, 2013, Prague, Czech Republic

Abstract

In this study, we present the results from an analysis of the various aspects of the low pressure RF plasma cleaning process for the removal of graphitic carbon contamination layers deposited on different test objects. After determining the optimum parameters for a time-minimized cleaning process using an inductively coupled plasma source as well as oxygen/argon mixtures as feedstock gas, a special emphasis has been put on the characterization of the cleaned surface (Au, Ni, Rh) both in their pristine as well as in their cleaned state. This includes the physical as well as the chemical properties of the surfaces involved. Last but not least, an effort has been made to characterize/monitor the RF plasma during the cleaning procedure in order to allow for an improved process control.

Citation Download Citation

E. Pellegrin, I. Šics, C. Pérez Sempere, J. Reyes Herrera, and V. Carlino "RF plasma cleaning of mirror surfaces: characterization, optimization, and surface physics aspects of plasma cleaning", Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 87770P (3 May 2013); https://doi.org/10.1117/12.2019216

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