Improve the laser damage resistance of fused silica by wet surface cleaning and optimized HF etch process

Xiaolong Jiang; Ying Liu; Huanle Rao; Shaojun Fu

doi:10.1117/12.2020734

9 July 2013 Improve the laser damage resistance of fused silica by wet surface cleaning and optimized HF etch process

Xiaolong Jiang, Ying Liu, Huanle Rao, Shaojun Fu

Proceedings Volume 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers; 87860Q (2013) https://doi.org/10.1117/12.2020734
Event: SPIE/SIOM Pacific Rim Laser Damage: Optical Materials for High-Power Lasers, 2013, Shanghai, China

Abstract

Fabrication-induced metal contaminations and subsurface damage are generally identified as the laser damage initiators that are responsible for the laser induced damage in fused silica. In this paper, the removal of those two initiators are realized by two methods: wet chemical surface cleaning and optimized HF-based etch process. Two kinds of chemical leaching are used to removing the Ce and other metal impurities respectively. In order prevent the redeposition of the reactive byproducts during HF etch process, we optimized the traditional HF etch process in two ways: absence of NH₄F in etch solution and presence of megasonic and ultrasonic agitation during and after etch respectively. And laser damage tests show that these two treatments greatly improve the laser damage resistance of fused silica.

Citation Download Citation

Xiaolong Jiang, Ying Liu, Huanle Rao, and Shaojun Fu "Improve the laser damage resistance of fused silica by wet surface cleaning and optimized HF etch process", Proc. SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers, 87860Q (9 July 2013); https://doi.org/10.1117/12.2020734

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