New integrated Monte Carlo code for the simulation of high-resolution scanning electron microscopy images for metrology in microlithography

Emre Ilgüsatiroglu; Alexey Yu. Illarionov; Mauro Ciappa; Paul Pfäffli; Lars Bomholt

doi:10.1117/12.2048306

2 April 2014 New integrated Monte Carlo code for the simulation of high-resolution scanning electron microscopy images for metrology in microlithography

Emre Ilgüsatiroglu, Alexey Yu. Illarionov, Mauro Ciappa, Paul Pfäffli, Lars Bomholt

Author Affiliations +

Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 90500I (2014) https://doi.org/10.1117/12.2048306
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

A new Monte Carlo code is presented that includes among others definition of arbitrary geometries with sub-nanometer resolution, high performance parallel computing capabilities, trapped charge, electric field calculation, electron tracking in electrostatic field, and calculation of 3D dose distributions. These functionalities are efficiently implemented thanks to the coupling of the Monte Carlo simulator with a TCAD environment. Applications shown are the synthesis of SEM linescans and images that focus on the evaluation of the impact of proximity effects and self charging on the quantitative extraction of critical dimensions in dense photoresist structures.

Citation Download Citation

Emre Ilgüsatiroglu, Alexey Yu. Illarionov, Mauro Ciappa, Paul Pfäffli, and Lars Bomholt "New integrated Monte Carlo code for the simulation of high-resolution scanning electron microscopy images for metrology in microlithography", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90500I (2 April 2014); https://doi.org/10.1117/12.2048306

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