Photolithography Expert Systems At National Semiconductor

Pilla A. Leitner; Robert L. Brown

doi:10.1117/12.968377

1 January 1988 Photolithography Expert Systems At National Semiconductor

Pilla A. Leitner, Robert L. Brown

Proceedings Volume 0921, Integrated Circuit Metrology, Inspection, and Process Control II; (1988) https://doi.org/10.1117/12.968377
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Two expert systems for photolithography are discussed and compared. The systems are found to be beneficial to both engineers and technicians. Important implementation issues are presented.

Citation Download Citation

Pilla A. Leitner and Robert L. Brown "Photolithography Expert Systems At National Semiconductor", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968377

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available