Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications. The "Optical" Tapering Of Contacts And Vias.

Marco I. Buraschi; Laura Bacci; Giorgio De Santi

doi:10.1117/12.968418

1 January 1988 Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications. The "Optical" Tapering Of Contacts And Vias.

Marco I. Buraschi, Laura Bacci, Giorgio De Santi

Author Affiliations +

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968418
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A novel way to obtain tapered profile in photoresist is proposed. Opening at the mask level near the principal features, some slits smaller than the resolution limit of the projection optic at a distance also smaller than it, we can obtain a controlled sloped profile in photoresist. We have already applied this method to open tapered contacts and vias without using the thermal-reflow tecnique of BPSG optimizing the configuration of the subresolved slits. There is the experimental evidence that it is retained the possibility to open contacts up to the diffraction limit of the projection optics. Our method is Patent Pending .

Citation Download Citation

Marco I. Buraschi, Laura Bacci, and Giorgio De Santi "Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications. The "Optical" Tapering Of Contacts And Vias.", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968418

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