Paper
18 September 2014 Germanium devices for integrated photonic circuits
F. Kenneth Hopkins, Alexander Benken, Kevin M. Walsh, John Jones, Kent Averett
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Abstract
World-wide interest in germanium-on-silicon photonics has grown enormously during the past few years. We report on our study of germanium deposition for which we found that there is potential to engineer films with significant increases in hole mobility. In addition, we report on our development of wet-etch techniques to pattern thin films and to form tapered regions of Ge, both important for the fabrication of Ge photonic devices.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F. Kenneth Hopkins, Alexander Benken, Kevin M. Walsh, John Jones, and Kent Averett "Germanium devices for integrated photonic circuits", Proc. SPIE 9226, Nanophotonics and Macrophotonics for Space Environments VIII, 92260I (18 September 2014); https://doi.org/10.1117/12.2061080
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KEYWORDS
Germanium

Etching

Photonic integrated circuits

Silicon

Crystals

Integrated photonics

Integrated circuit design

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