Characterization of decay component of resist surface charging on EBM-8000

Noriaki Nakayamada; Takashi Kamikubo; Hirohito Anze; Muheniro Ogasawara

doi:10.1117/12.2070827

28 July 2014 Characterization of decay component of resist surface charging on EBM-8000

Noriaki Nakayamada, Takashi Kamikubo, Hirohito Anze, Muheniro Ogasawara

Proceedings Volume 9256, Photomask and Next-Generation Lithography Mask Technology XXI; 925609 (2014) https://doi.org/10.1117/12.2070827
Event: Photomask Japan 2014, 2014, Yokohama, Japan

Abstract

In our previous work, we reported the static portion of the surface charging on EBM-8000 and compared it with that on EBM-6000. The scope of this paper is to report the analysis of charging decay component on EBM-8000 and compare it with EBM-6000. We confirmed that our fundamental modeling scheme of the charging decay worked well on EBM-8000 as well as on EBM-6000. However, we found totally different charging decay behaviors between EBM-8000 and EBM-6000. To explain the results, we propose a conceptual model of the charging decay phenomena both on EBM-8000 and EBM-6000.

Citation Download Citation

Noriaki Nakayamada, Takashi Kamikubo, Hirohito Anze, and Muheniro Ogasawara "Characterization of decay component of resist surface charging on EBM-8000", Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 925609 (28 July 2014); https://doi.org/10.1117/12.2070827

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