Paper
11 November 2014 High divergent 2D grating
Author Affiliations +
Abstract
A 3×3 high divergent 2D-grating with period of 3.842μm at wavelength of 850nm under normal incidence is designed and fabricated in this paper. This high divergent 2D-grating is designed by the vector theory. The Rigorous Coupled Wave Analysis (RCWA) in association with the simulated annealing (SA) is adopted to calculate and optimize this 2D-grating.The properties of this grating are also investigated by the RCWA. The diffraction angles are more than 10 degrees in the whole wavelength band, which are bigger than the traditional 2D-grating. In addition, the small period of grating increases the difficulties of fabrication. So we fabricate the 2D-gratings by direct laser writing (DLW) instead of traditional manufacturing method. Then the method of ICP etching is used to obtain the high divergent 2D-grating.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jin Wang, Jianyong Ma, and Changhe Zhou "High divergent 2D grating", Proc. SPIE 9271, Holography, Diffractive Optics, and Applications VI, 92711E (11 November 2014); https://doi.org/10.1117/12.2071324
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KEYWORDS
Diffraction

Diffraction gratings

Etching

Multiphoton lithography

Beam splitters

Optical design

Microscopes

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