Paper
21 August 2014 Diffractive optical elements: fabrication and application
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Abstract
We review our recent progress on development of the methods for fabrication of precision binary and as well as highefficiency continuous-relief diffractive optical elements (DOEs) by combining complementary advantages of circular laser writing system (CLWS), direct laser beam writing in thermal and photo-sensitive materials and analog lithography. The main limitation and tolerances of writing methods are identified, and their influence on optical performance of DOEs is investigated. The latest results of fabrication and practical applications of DOEs with more than 200 mm diameter and a minimum feature size of 0.5 micrometer for testing large aspheric surfaces with a Fizeau-type interferometer are presented.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. G. Poleshchuk, V. P. Korolkov, and R. K. Nasyrov "Diffractive optical elements: fabrication and application", Proc. SPIE 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 928302 (21 August 2014); https://doi.org/10.1117/12.2073301
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Cited by 5 scholarly publications.
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KEYWORDS
Diffractive optical elements

Photomasks

Diffraction

Wavefronts

Optical fabrication

Binary data

Diffraction gratings

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