Deep ultra-violet beam profile measurement of KrF laser using laser induced fluorescence

Caihong Ma; Zhixing Gao

doi:10.1117/12.2085055

19 February 2015 Deep ultra-violet beam profile measurement of KrF laser using laser induced fluorescence

Caihong Ma, Zhixing Gao

Proceedings Volume 9449, The International Conference on Photonics and Optical Engineering (icPOE 2014); 944911 (2015) https://doi.org/10.1117/12.2085055
Event: The International Conference on Photonics and Optical Engineering and the Annual West China Photonics Conference (icPOE 2014), 2014, Xi'an, China

Abstract

Abstract: An instrument was built to measure the output fluorescence response characteristics of a 248nm KrF laser using 4mm-thick fluorescent glass as a screen. Experiments show when irradiated laser intensity is no more than 0.7J/cm^2, the fluorescent response is linear. And the fluorescent spot intensity distribution was spatial coherent with the output beam profile distribution of the LPX-150. So we can use high-homogeneity optical glasses as fluorescence wavelength conversion material in beam profile measurements.

Citation Download Citation

Caihong Ma and Zhixing Gao "Deep ultra-violet beam profile measurement of KrF laser using laser induced fluorescence", Proc. SPIE 9449, The International Conference on Photonics and Optical Engineering (icPOE 2014), 944911 (19 February 2015); https://doi.org/10.1117/12.2085055

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