The universal method for optimization of undulator tapering in FEL amplifiers

E. A. Schneidmiller; M. V. Yurkov

doi:10.1117/12.2181230

12 May 2015 The universal method for optimization of undulator tapering in FEL amplifiers

E. A. Schneidmiller, M. V. Yurkov

Author Affiliations +

Proceedings Volume 9512, Advances in X-ray Free-Electron Lasers Instrumentation III; 951219 (2015) https://doi.org/10.1117/12.2181230
Event: SPIE Optics + Optoelectronics, 2015, Prague, Czech Republic

Abstract

Technique of undulator tapering in the post-saturation regime is used at the existing x-ray FELs for increasing the radiation power. There are also discussions on the future of high peak and average power FELs for scientific and industrial applications. Diffraction effects essentially influence on the choice of the tapering strategy. Recent studies resulted in an general law of the undulator tapering for a seeded FEL amplifier. In this paper we extend these results for the case of the Self Amplified Spontaneous Emission (SASE) FEL.

Citation Download Citation

E. A. Schneidmiller and M. V. Yurkov "The universal method for optimization of undulator tapering in FEL amplifiers", Proc. SPIE 9512, Advances in X-ray Free-Electron Lasers Instrumentation III, 951219 (12 May 2015); https://doi.org/10.1117/12.2181230

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE