In general the COG at the edge of the slit is often worse than in the center part of the slit. Recently, ASML has released the NXT:1980Di that is equipped with an enhanced illuminator to improve pupil COG variation across the slit. In this paper we explore the performance of this scanner system and show that the AIT variation across the slit is also reduced significantly. |
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CITATIONS
Cited by 1 scholarly publication.
Scanners
Optical alignment
Lithographic illumination
Image enhancement
Reticles
Lithography
Optical lithography