Presentation
5 March 2022 Nanoimprint process for scalable manufacture of silicon nitride metalenses
Andrew McClung, Mahsa Torfeh, Vincent J. Einck, James J. Watkins, Amir Arbabi
Author Affiliations +
Proceedings Volume PC12011, High Contrast Metastructures XI; PC120110V (2022) https://doi.org/10.1117/12.2608689
Event: SPIE OPTO, 2022, San Francisco, California, United States
Abstract
With high feature density and subwavelength dimensions, visible spectrum metalenses are challenging to scalably manufacture. Electron beam lithography and short-wavelength photolithography capable of patterning metalenses for the visible do so at high cost per wafer. Here, we present a low-cost and scalable fabrication process based on nanoimprint lithography, and use it to demonstrate metalenses designed for 550 nm light with 4 mm diameter and NA=0.2. Our metalenses are formed of silicon nitride nanoposts with critical dimensions smaller than 100 nm. In this presentation we report focusing efficiencies above 50%, share holographic characterization data, and demonstrate imaging.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew McClung, Mahsa Torfeh, Vincent J. Einck, James J. Watkins, and Amir Arbabi "Nanoimprint process for scalable manufacture of silicon nitride metalenses", Proc. SPIE PC12011, High Contrast Metastructures XI, PC120110V (5 March 2022); https://doi.org/10.1117/12.2608689
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KEYWORDS
Silicon

Manufacturing

Nanoimprint lithography

Electron beam lithography

Dry etching

Polymethylmethacrylate

Visible radiation

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