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4 October 2022 Displacement talbot lithography: a new and versatile technology for printing periodic nanostructures (Conference Presentation)
Harun H. Solak
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Proceedings Volume PC12201, UV and Higher Energy Photonics: From Materials to Applications 2022; PC1220106 (2022) https://doi.org/10.1117/12.2635960
Event: SPIE Nanoscience + Engineering, 2022, San Diego, California, United States
Abstract
High-resolution periodic patterns such as gratings or two-dimensional arrays are required in many applications, especially in photonics devices such as near eye displays (AR/VR), DFB lasers or plasmonic or diffraction based biosensors. Displacement Talbot Lithography (DTL) is a new photolithography technique that enables patterning of large areas with high-resolution periodic structures. DTL offers resolution well below 100nm, which is sufficient even for the most demanding applications that require sub-wavelength resolution such as wire-grid polarizers or anti-reflection surfaces. The new imaging principle of DTL opens new possibilities in the field of photo lithography and its applications.
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Harun H. Solak "Displacement talbot lithography: a new and versatile technology for printing periodic nanostructures (Conference Presentation)", Proc. SPIE PC12201, UV and Higher Energy Photonics: From Materials to Applications 2022, PC1220106 (4 October 2022); https://doi.org/10.1117/12.2635960
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KEYWORDS
Printing
Lithography
Nanostructures
Optical lithography
Photonics
Eye
Laser applications
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