Presentation
16 November 2022 Applicability Fastmicro product scanner as particle detection metrology tool
Author Affiliations +
Abstract
Opto-mechatronic systems are getting smaller and require higher accuracy. Improved surface particle cleanliness and defectivity control, preferably below the micrometer range, is required to keep performance and yield at the same level. To fill this need, the Fastmicro Product Scanner is developed to measure surface particle contamination levels directly on a large product surface: such as blank wafers, backside of wafers, reticles, both sides of pellicles, displays and other products. This manuscript describes the investigation of the applicability of the Fastmicro Product Scanner • as particle detection tool • as part of a hybrid particle qualification tool with the Fastmicro Product Scanner taking care of the particle detection and particle location measurement. • for various types of samples
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hendrik Ketelaars "Applicability Fastmicro product scanner as particle detection metrology tool", Proc. SPIE PC12293, Photomask Technology 2022, PC1229305 (16 November 2022); https://doi.org/10.1117/12.2641788
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KEYWORDS
Particles

Scanners

Metrology

Semiconducting wafers

Opto mechatronics

Particle contamination

Pellicles

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