Venturing beyond the limits of nano-imprint lithography for immersive displays

Bernard C. Kress

doi:10.1117/12.2669885

30 April 2023 Venturing beyond the limits of nano-imprint lithography for immersive displays

Bernard C. Kress

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Proceedings Volume PC12497, Novel Patterning Technologies 2023; PC1249701 (2023) https://doi.org/10.1117/12.2669885
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Mass adoption of AR,VR and MR headset as gateways to the Metaverse use and smart glasses for contextual displays are conditioned by solving all three immersive displays comfort pillars: wearable, visual and social. To do so, new micro- and nano-fabrication challenges need to be addressed, specifically efficient waveguide combiners and miniature display engines. Novel lithographic fabrication techniques are needed to reduce costs and improve performance of such optical display building blocks especially when targeting the consumer market. We will review conventional and novel nano-imprint technologies that aim at pushing the envelope beyond what is possible today.

Conference Presentation

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Bernard C. Kress "Venturing beyond the limits of nano-imprint lithography for immersive displays", Proc. SPIE PC12497, Novel Patterning Technologies 2023, PC1249701 (30 April 2023); https://doi.org/10.1117/12.2669885

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