Poster
22 November 2023 Flexible, actinic EUV mask blank reflectometer EUV-MBR 4.0
Rainer Lebert, Andreas Biermanns-Foeth, Christoph Phiesel, Thomas Missalla
Author Affiliations +
Conference Poster
Abstract
RI offers EUV reflectometers with “spectroscopic reflectometry” measuring spectral reflectance curves in 5 seconds and excelling in spectral resolution. For quality verification our AIMER™ concept condenses the spectral reflectance into one single figure of merit, the “scanner effective reflectance”. Acquiring 20×20 mm2 with 4 Megapixels is within seconds. Many of our EUVL tools use the AIMER, as for example the EUV-PRTT, which is now standard in EUV pellicle supply chain. With this development, we upgraded our tool platforms towards ultra-cleanliness and improved reliability. Combining the experience on spectral and AIMER reflectometry with the new generic platform yields our new EUV-MBR-4.0.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rainer Lebert, Andreas Biermanns-Foeth, Christoph Phiesel, and Thomas Missalla "Flexible, actinic EUV mask blank reflectometer EUV-MBR 4.0", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500Z (22 November 2023); https://doi.org/10.1117/12.2687771
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Reflectometry

Extreme ultraviolet

Pellicles

Image quality

Reflectance spectroscopy

Reflection

Reflectivity

Back to Top