Development of nanoimprint templates by multiple patterning technology and its application

Takaharu Nagai; Hisayoshi Watanabe; Hideki Cho

doi:10.1117/12.3010084

10 April 2024 Development of nanoimprint templates by multiple patterning technology and its application

Takaharu Nagai, Hisayoshi Watanabe, Hideki Cho

Author Affiliations +

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560A (2024) https://doi.org/10.1117/12.3010084
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Nanoimprint lithography, NIL, has been developed for semiconductor lithography technology. In order to extend the field of NIL application, we have proposed templates for transferring three-dimensional shapes, such as dual damascene, and dense hole templates processed by LELE technique, which require high overlay accuracy of EB writing tools. In this presentation, we will discuss the performance of our template fabricated by using various multiple patterning technique. The layout of these templates includes both single layered fine features and multilayered structures, considering applications for random logic patterns and periphery of memory.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Takaharu Nagai, Hisayoshi Watanabe, and Hideki Cho "Development of nanoimprint templates by multiple patterning technology and its application", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560A (10 April 2024); https://doi.org/10.1117/12.3010084

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