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10 April 2024 Combining one- and multiphoton direct laser writing for high throughput and resolution
Willi G. Mantei, Benedikt Stender, Christian Pies, Dominique Colle
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Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560I (2024) https://doi.org/10.1117/12.3010401
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
The field of 3D printing, particularly in micro- and nanoscale resolutions, has witnessed significant advancements in recent years. However, one persisting challenge is the limited throughput of techniques like 2-Photon-Polymerization (2PP), which often lags behind established direct laser writing systems in terms of volume written per unit of time. This contrast in throughput hinders the widespread adoption of 2PP, despite its unique capacity for three-dimensional fabrication with minimal feature sizes below 100 nm. To bridge this gap and unlock the full potential of 2PP, we propose a novel approach: the integration of standard lithography techniques with multiphoton lithography. In this presentation, we will present our results obtained through combined exposures.
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Willi G. Mantei, Benedikt Stender, Christian Pies, and Dominique Colle "Combining one- and multiphoton direct laser writing for high throughput and resolution", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560I (10 April 2024); https://doi.org/10.1117/12.3010401
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KEYWORDS
Multiphoton lithography
Two photon polymerization
3D printing
Fabrication
Lithography
Microelectromechanical systems
Microlens array
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