Integrating high-k into production, 2001-2007
Abstract
In the third act of this innovation story, the gate stack development entered a highly competitive phase. The right material for the high-k dielectric was selected, and the production technique and materials were integrated into a complete chip production chain. How chip manufacturers controlled the integration of the new production techniques in their existing manufacturing lines was highly proprietary. This knowledge defined their ability to compete.
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KEYWORDS
Dielectrics

Atomic layer deposition

Manufacturing

Metals

Transistors

Hafnium

Semiconductors

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