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Topics include a state-of-the-art overview and in-depth explanation of photon source requirements, fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), a description of prominent DPP and LPP designs, and other technologies for producing EUV radiation at 13.5 nm. Additionally, this volume contains detailed descriptions of 193-nm excimer lasers, UV lamps, and laser-driven plasma sources for UV photons, all of which power many current lithography and metrology tools. CO2 lasers and 1-µm Nd-YAG lasers, used for pre-pulse in Sn LPP EUV sources, are also covered. Alternative photon sources for 13.5-nm lithography and metrology, such as high-harmonic generation (HHG) and synchrotrons, along with their usage as a metrology tool, are discussed; and potential future photon sources such as free-electron lasers (FELs), solid-state 2-µm thulium lasers, and 1-µm Nd-YAG lasers are described. Additional topics include EUV source metrology, plasma diagnostics of EUV plasmas, grazing and normal incidence collector optics for plasma sources, debris mitigation, and mechanisms of component erosion in EUV sources. |
CHAPTER 2.
Laser-Produced Plasma Sources for Short-Wavelength Applications Including Lithography and Microscopy
CHAPTER 3.
CHAPTER 4.
CHAPTER 6.
CHAPTER 7.
CHAPTER 8.
CHAPTER 10.
CHAPTER 11.
CHAPTER 12.
CHAPTER 13.
CHAPTER 14.
CHAPTER 15B.
CHAPTER 17.
CHAPTER 19.
CHAPTER 20.
CHAPTER 21.
CHAPTER 22.
CHAPTER 23.
CHAPTER 24.
