Open Access
16 December 2014 Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics
Abhijit A. Patil, Yogendra Narayan Pandey, Manolis Doxastakis, Gila E. Stein
Author Affiliations +
Funded by: National Science Foundation
Abstract
The acid-catalyzed deprotection of glassy poly(4-hydroxystyrene-co-tertbutyl acrylate) films was studied with infrared absorbance spectroscopy and stochastic simulations. Experimental data were interpreted with a simple description of subdiffusive acid transport coupled to second-order acid loss. This model predicts key attributes of observed deprotection rates, such as fast reaction at short times, slow reaction at long times, and a nonlinear dependence on acid loading. Fickian diffusion is approached by increasing the postexposure bake temperature or adding plasticizing agents to the polymer resin. These findings demonstrate that acid mobility and overall deprotection kinetics are coupled to glassy matrix dynamics. To complement the analysis of bulk kinetics, acid diffusion lengths were calculated from the anomalous transport model and compared with nanopattern line widths. The consistent scaling between experiments and simulations suggests that the anomalous diffusion model could be further developed into a predictive lithography tool.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2014/$25.00 © 2014 SPIE
Abhijit A. Patil, Yogendra Narayan Pandey, Manolis Doxastakis, and Gila E. Stein "Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(4), 043017 (16 December 2014). https://doi.org/10.1117/1.JMM.13.4.043017
Published: 16 December 2014
Lens.org Logo
CITATIONS
Cited by 5 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Diffusion

Polymers

Data modeling

Photoresist materials

Chemically amplified resists

Infrared spectroscopy

Nanostructures


CHORUS Article. This article was made freely available starting 16 December 2015

Back to Top