Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly

Joydeep Mitra; Andres Torres; Yuansheng Ma; David Z. Pan

doi:10.1117/1.JMM.17.1.013508

23 March 2018 Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly

Joydeep Mitra, Andres Torres, Yuansheng Ma, David Z. Pan

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 17, Issue 1, 013508 (March 2018). https://doi.org/10.1117/1.JMM.17.1.013508

Abstract

Directed self-assembly (DSA) has emerged as one of the most compelling next-generation patterning techniques for sub 7 nm via or contact layers. A key issue in enabling DSA as a mainstream patterning technique is the generation of grapho-epitaxy-based guiding pattern (GP) shapes to assemble the contact patterns on target with high fidelity and resolution. Current GP generation is mostly empirical, and limited to a very small number of via configurations. We propose the first model-based GP synthesis algorithm and methodology for on-target and robust DSA, on general via pattern configurations. The final postoptical proximity correction-printed GPs derived from our original synthesized GPs are resilient to process variations and continue to maintain the same DSA fidelity in terms of placement error and target shape.

Citation Download Citation

Joydeep Mitra, Andres Torres, Yuansheng Ma, and David Z. Pan "Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly," Journal of Micro/Nanolithography, MEMS, and MOEMS 17(1), 013508 (23 March 2018). https://doi.org/10.1117/1.JMM.17.1.013508

Received: 18 December 2017; Accepted: 6 March 2018; Published: 23 March 2018

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