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Philip C. W. Ng, Kuen-Yu Tsai, Yen-Min Lee, Fu-Min Wang, Jia-Han Li, Alek C. Chen, "Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects," J. Micro/Nanolith. MEMS MOEMS 10(2) 029801 (1 April 2011) https://doi.org/10.1117/1.3576188