Importance of surface modification of a microcontact stamp for pattern fidelity of soluble organic semiconductors

Hea-Lim Park; BoYeon Lee; Se-Um Kim; Jeng-Hun Suh; Min-Hoi Kim; Sin-Doo Lee

doi:10.1117/1.JMM.15.1.013501

22 January 2016 Importance of surface modification of a microcontact stamp for pattern fidelity of soluble organic semiconductors

Hea-Lim Park, BoYeon Lee, Se-Um Kim, Jeng-Hun Suh, Min-Hoi Kim, Sin-Doo Lee

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 1, 013501 (January 2016). https://doi.org/10.1117/1.JMM.15.1.013501

Abstract

We described the effect of the ultraviolet ozone (UVO) treatment of a polydimethylsiloxane (PDMS) stamp on the fidelity of 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS-PEN) patterns produced from a TIPS-PEN/polymer blend by selective contact evaporation (SCE). During the SCE process, the TIPS-PEN in contact with the nanoporous PDMS was absorbed into the PDMS stamp, leaving out the TIPS-PEN patterns, complementary to the PDMS patterns, in the noncontact regions. For the case of the untreated, hydrophobic PDMS surface, the TIPS-PEN patterns developed initially were shrunken and eventually disappeared after 24 h due to the steady absorption of the TIPS-PEN in time. In contrast, for the UVO-treated case, the TIPS-PEN patterns were found to maintain the initial shapes over the period of 24 h since the absorption of the TIPS-PEN was limited by the hydrophilic nature of the UVO-treated PDMS. The modified PDMS surface by the UVO for 30 min yielded the highest fidelity of the TIPS-PEN patterns in both height and width. The patterned TIPS-PEN layer by the SCE was implemented into an organic field-effect transistor to demonstrate the viability of the SCE combined with the UVO treatment for solution-processed organic electronic devices.

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Hea-Lim Park, BoYeon Lee, Se-Um Kim, Jeng-Hun Suh, Min-Hoi Kim, and Sin-Doo Lee "Importance of surface modification of a microcontact stamp for pattern fidelity of soluble organic semiconductors," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(1), 013501 (22 January 2016). https://doi.org/10.1117/1.JMM.15.1.013501

Published: 22 January 2016

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