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23 July 2021 Publication guidelines for patterning tools
Harry J. Levinson
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Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 20, Issue 3, 030101 (July 2021). https://doi.org/10.1117/1.JMM.20.3.030101
Abstract
Editor-in-Chief Harry Levinson outlines new guidelines on research involving patterning tools.
© 2021 Society of Photo-Optical Instrumentation Engineers (SPIE)
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Harry J. Levinson "Publication guidelines for patterning tools," Journal of Micro/Nanopatterning, Materials, and Metrology 20(3), 030101 (23 July 2021). https://doi.org/10.1117/1.JMM.20.3.030101
Published: 23 July 2021
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KEYWORDS
Semiconducting wafers
Electron beam lithography
Optical lithography
Lithography
Nanoimprint lithography
Optical alignment
Overlay metrology
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