Abstract

This is a list of reviewers who served the Journal of Micro/Nanopatterning, Materials, and Metrology in 2021.

The Journal of Micro/Nanopatterning, Materials, and Metrology would like to sincerely thank the following individuals who served as reviewers in 2021. The success of our publication hinges on the voluntary contributions of time and energy put forth by these professionals.

  • Amr Abdo

  • Kostas Adam

  • Gilles Amblard

  • George Antonelli

  • Ajay Baranwal

  • Philippe Bezard

  • Gregory Blachut

  • Ingo Bork

  • Sascha Brose

  • Derk Brouns

  • Timothy Brunner

  • Peter Buck

  • Stefano Cabrini

  • Steven Carson

  • Sonia Castellanos

  • Tom Cecil

  • Li-Jin Chen

  • Anshuman Cherala

  • Jennifer Church

  • Chris Clifford

  • Wim Coene

  • Vassilios Constantoudis

  • Ralph Dammel

  • Peter De Bisschop

  • Anuja De Silva

  • Onur Demirer

  • Bappaditya Dey

  • Jianglei Di

  • Alain Diebold

  • Dhairya Dixit

  • Andreas Erdmann

  • Roberto Fallica

  • Jo Finders

  • Andreas Frommhold

  • Gregg Gallatin

  • Nadia Gambino

  • Bernd Geh

  • Annamaria Gerardino

  • Kenneth Goldberg

  • Dario Goldfarb

  • Yuri Granik

  • Luca Grella

  • Douglas Guerrero

  • Puneet Gupta

  • Scott Halle

  • John Hartley

  • Harish Hiriyannaiah

  • Barmak Honarvar Shakibaei Asli

  • Stephen Hsu

  • Doyoung Jang

  • Ningning Jia

  • Kokoro Kato

  • Dimitrios Kazazis

  • Insung Kim

  • Ryoung-han Kim

  • Seong-Sue Kim

  • Ivan Kissiov

  • R. Kline

  • Dwayne LaBrake

  • Kafai Lai

  • Romain Lallement

  • Michael Lam

  • Zachary Levinson

  • Kenan Li

  • Ted Liang

  • Changmoon Lim

  • Qinghuang Lin

  • Peng Liu

  • Zewen Liu

  • Hans Loeschner

  • Dmitry Lopaev

  • Gian Lorusso

  • Ming Lu

  • Xu Ma

  • Yuansheng Ma

  • Chris Mack

  • Dominique Mailly

  • John Maltabes

  • Pawitter Mangat

  • Lawrence Melvin, III

  • Mike Meyer

  • Sascha Migura

  • Iacopo Mochi

  • Tetsuro Nakasugi

  • Amrit Narasimhan

  • Ricarda Nebling

  • Mark Neisser

  • Andrew Neureuther

  • Apoorva Oak

  • Yaw Obeng

  • Hye-Keun Oh

  • Takeyoshi Ohashi

  • Uzodinma Okoroanyanwu

  • Laurent Pain

  • David Pan

  • Linyong (Leo) Pang

  • Eric Panning

  • Danping Peng

  • Michele Perego

  • John Petersen

  • Michael Postek

  • Angelique Raley

  • Abbas Rastegar

  • Stephen Renwick

  • Douglas Resnick

  • Alexander Ribbe

  • Lucia Romano

  • Julius Joseph Santillan

  • Iqbal Saraf

  • Serap Savari

  • Franklin Schellenberg

  • Helmut Schift

  • Daniel Schmidt

  • Frank Scholze

  • Uwe Schroeder

  • James Schwiegerling

  • Kazunori Seki

  • Jing Sha

  • James Shiely

  • Bruce W. Smith

  • Nigel Smith

  • Mark Somervell

  • Daniel Sullivan

  • Hayden Taylor

  • Vikram Tolani

  • Kuen-Yu Tsai

  • Ion Turcu

  • Alessandro Vaglio Pret

  • Marcus Van de Kerkhof

  • Robbert van de Kruijs

  • Lieve Van Look

  • Erik Verduijn

  • Andras Vladar

  • Thomas Wallow

  • Ulrich Welling

  • Benjamin Wunsch

  • Takehisa Yahiro

  • Kenji Yamazoe

  • Wataru Yashiro

  • Zhengmao Ye

  • Guojing Zhang

  • Wei Zheng

  • Xiangyu Zhou

  • Joerg Zimmermann

© 2022 Society of Photo-Optical Instrumentation Engineers (SPIE)
"2021 List of Reviewers," Journal of Micro/Nanopatterning, Materials, and Metrology 21(1), 010102 (20 January 2022). https://doi.org/10.1117/1.JMM.21.1.010102
Published: 20 January 2022
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
Back to Top