Abstract

JM3 thanks the reviewers who served the journal in 2022.

The Journal of Micro/Nanopatterning, Materials, and Metrology would like to sincerely thank the following individuals who served as reviewers in 2022. The success of our publication hinges on the voluntary contributions of time and energy put forth by these professionals.

  • Ravikiran Attota

  • Ajay Baranwal

  • William Barletta

  • John Biafore

  • Daisuke Bizen

  • Barak Bringoltz

  • Robert Bristol

  • Timothy Brunner

  • Yang Bu

  • Benjamin Buckner

  • Ralf Buengener

  • Anatoly Burov

  • Sonia Castellanos

  • Aron Cepler

  • Narendra Chaudhary

  • Minfeng Chen

  • Jeongsub Choi

  • Jin Choi

  • Jennifer Church

  • Will Conley

  • Vassilios Constantoudis

  • Charlotte Cutler

  • Anuja De Silva

  • Danilo De Simone

  • Arie Den Boef

  • Jingyuan Deng

  • Bappaditya Dey

  • Alain Diebold

  • Ilan Englard

  • Andreas Erdmann

  • Peter Evanschitzky

  • Nelson Felix

  • Jo Finders

  • Donis Flagello

  • Guillaume Freychet

  • Thomas Germer

  • Dario Goldfarb

  • Yuri Granik

  • Steven Grzeskowiak

  • Douglas Guerrero

  • Dandan Han

  • Carsten Hartig

  • Craig Higgins

  • Ulrich Hofmann

  • Stephen Hsu

  • Osamu Inoue

  • Nathan Ip

  • Toshiro Itani

  • Konstantins Jefimovs

  • Chih-Ming Ke

  • R. Kline

  • Shinji Kobayashi

  • Roman Kris

  • Takanori Kudo

  • Roderick R. Kunz

  • Bertrand Le Gratiet

  • Philippe Leduc

  • Zachary Levinson

  • Scott Lewis

  • Ted Liang

  • Fei Liu

  • Peng Liu

  • Kenneth Luey

  • Chris Mack

  • Mohammad Hossein Mahdieh

  • Theodore Manouras

  • Lawrence Melvin, III

  • Hazem Mesilhy

  • Iacopo Mochi

  • Gangadhara Raja Muthinti

  • Seiji Nagahara

  • George Neil

  • Toan Nguyen

  • Yaw Obeng

  • Michio Ohashi

  • Takeyoshi Ohashi

  • Ndubuisi Orji

  • George Papavieros

  • Brennan Peterson

  • Thomas Pistor

  • Michael Postek

  • Jerome Reche

  • Alex Robinson

  • Lucia Romano

  • Mohamed Saib

  • Mohammad Saifullah

  • Julius Joseph Santillan

  • Serap Savari

  • Helmut Schift

  • Kazunori Seki

  • Jae Hwan Sim

  • Nigel Smith

  • Daniel Sunday

  • Kiyoshi Takamasu

  • Edita Tejnil

  • Jim Thackeray

  • Peter Trefonas

  • Sagar Trivedi

  • Kuen-Yu Tsai

  • Alessandro Vaglio Pret

  • Luc Van Kessel

  • Pradeep Vukkadala

  • Liyuan Wang

  • Takeo Watanabe

  • Donald Windover

  • Richard Winpenny

  • Jack Wong

  • Shang-Jung Wu

  • Kenji Yamazoe

  • Haoyu Yang

  • Shuji Ye

  • Zhengmao Ye

  • Changsheng Ying

  • Alexander Ypma

  • Bei Yu

  • Libin Zhang

  • Joerg Zimmermann

© 2023 Society of Photo-Optical Instrumentation Engineers (SPIE)
"2022 List of Reviewers," Journal of Micro/Nanopatterning, Materials, and Metrology 22(1), 010102 (13 January 2023). https://doi.org/10.1117/1.JMM.22.1.010102
Published: 13 January 2023
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KEYWORDS
Metrology

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