An Exciting Time to be a Lithographer

Harry J. Levinson

doi:10.1117/1.JMM.22.2.020101

5 June 2023 An Exciting Time to be a Lithographer

Harry J. Levinson

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 2, 020101 (June 2023). https://doi.org/10.1117/1.JMM.22.2.020101

Abstract

Editor-in-Chief Harry J. Levinson gives an overview of the dynamic state of lithography and potential new directions the technology could take.

Citation Download Citation

Harry J. Levinson "An Exciting Time to be a Lithographer," Journal of Micro/Nanopatterning, Materials, and Metrology 22(2), 020101 (5 June 2023). https://doi.org/10.1117/1.JMM.22.2.020101

Published: 5 June 2023

ACCESS THE FULL ARTICLE

JOURNAL ARTICLE
2 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Lithography

Metrology

3D mask effects

Extreme ultraviolet lithography

Optical lithography

Design rules

Extreme ultraviolet

Show All Keywords

RELATED CONTENT

Overlay and edge placement control strategies for the 7nm node...
Proceedings of SPIE (March 13 2015)

OVL performance of HighNA stitched fields using Monte Carlo simulations
Proceedings of SPIE (January 01 1900)

Patterning control strategies for minimum edge placement error in logic...
Proceedings of SPIE (March 28 2017)

Addressing EUV masks registration challenges through closed loop correction (Conference...
Proceedings of SPIE (January 01 1900)

Novel pattern trimming and shrink material (PTM (PTD) and PSM...
Proceedings of SPIE (March 25 2016)

Novel monitoring of EUV litho cluster for manufacturing insertion
Proceedings of SPIE (March 23 2020)

Insertion strategy for EUV lithography
Proceedings of SPIE (March 13 2012)

Subscribe to Digital Library

Receive Erratum Email Alert

Show All Keywords

Keywords/Phrases

Search In:

Publication Years