Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems

Johannes Ruoff; Michael Totzeck

doi:10.1117/1.3173803

1 July 2009 Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems

Johannes Ruoff, Michael Totzeck

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 3, 031404 (July 2009). https://doi.org/10.1117/1.3173803

Abstract

We introduce the new concept of orientation Zernike polynomials, a base function representation of retardation and diattenuation in close analogy to the wavefront description by scalar Zernike polynomials. We show that the orientation Zernike polynomials provide a complete and systematic description of vector imaging using high numerical aperture lithography lenses and, hence, a basis for an in depth understanding of both polarized and unpolarized imaging, and its modeling.

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Johannes Ruoff and Michael Totzeck "Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(3), 031404 (1 July 2009). https://doi.org/10.1117/1.3173803

Published: 1 July 2009

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