Sensing performance of plasma-enhanced chemical vapor deposition SiC-SiO2-SiC horizontal slot waveguides

Gregory Pandraud; Eduardo Margallo-Balbas; Pasqualina M. Sarro

doi:10.1117/1.JNP.6.063530

22 November 2012 Sensing performance of plasma-enhanced chemical vapor deposition SiC-SiO2-SiC horizontal slot waveguides

Gregory Pandraud, Eduardo Margallo-Balbas, Pasqualina M. Sarro

Author Affiliations +

Journal of Nanophotonics, Vol. 6, Issue 1, 063530 (November 2012). https://doi.org/10.1117/1.JNP.6.063530

Abstract

We have studied, for the first time, the sensing capabilities of plasma-enhanced chemical vapor deposition (PECVD) SiC-SiO₂-SiC horizontal slot waveguides. Optical propagation losses were measured to be 23.9 dB/cm for the quasi-transverse magnetic mode. To assess the potential of this device as a sensor, we simulated the confinement factor in the slot. This simulation revealed that SiC-based slot waveguides can be used, advantangeously, for sensing as the confinement strongly varies with the refractive index of the slot material. A confinement factor change of 0.15/refractive index units was measured for different slot materials.

Citation Download Citation

Gregory Pandraud, Eduardo Margallo-Balbas, and Pasqualina M. Sarro "Sensing performance of plasma-enhanced chemical vapor deposition SiC-SiO2-SiC horizontal slot waveguides," Journal of Nanophotonics 6(1), 063530 (22 November 2012). https://doi.org/10.1117/1.JNP.6.063530

Published: 22 November 2012

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