14 September 2016 Optical constants of e-beam evaporated titanium dioxide thin films in the 25.5- to 612-eV energy region
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Abstract
The optical constants of titanium dioxide (TiO2) have been experimentally determined at energies in the extreme ultraviolet and soft x-ray spectral regions, from 25.5 to 612 eV. Measuring angle-dependent reflectance of amorphous TiO2 thin films with synchrotron radiation at the BEAR beamline of Synchrotron ELETTRA. The experimental reflectivity profiles were fitted to the Fresnel equations using a genetic algorithm applied to a least-square curve fitting method, obtaining values for δ and β. We compared our measurements with tabulated data. All samples were grown on Si (100) substrates by the electron-beam evaporation technique, with a substrate temperature of 150°C and deposition rates of 0.3 to 0.5  /s. Complete films characterization have been carried out with structural (XRD, ellipsometry, and profilometry), compositional (x-ray photoelectron spectroscopy), and morphological (atomic force microscopy) analyses.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2016/$25.00 © 2016 SPIE
Antonela Comisso, Marco Nardello, Angelo Giglia, and Piergiorgio Nicolosi "Optical constants of e-beam evaporated titanium dioxide thin films in the 25.5- to 612-eV energy region," Optical Engineering 55(9), 095102 (14 September 2016). https://doi.org/10.1117/1.OE.55.9.095102
Published: 14 September 2016
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Cited by 2 scholarly publications.
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KEYWORDS
Reflectivity

Thin films

Silicon

Titanium dioxide

Contamination

Interfaces

Statistical modeling

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