Optical characterization of silicon dioxide thin films prepared by ion-assisted electron beam deposition

Mukesh Kumar; Suman Tewary; Neelam Kumari; Amit Lochan Sharma; Vinod Karar

doi:10.1117/1.OE.58.6.065104

27 June 2019 Optical characterization of silicon dioxide thin films prepared by ion-assisted electron beam deposition

Mukesh Kumar, Suman Tewary, Neelam Kumari, Amit Lochan Sharma, Vinod Karar

Author Affiliations +

Funded by: Focused Basic Research (FBR)

Optical Engineering, Vol. 58, Issue 6, 065104 (June 2019). https://doi.org/10.1117/1.OE.58.6.065104

Abstract

A single-layer SiO₂ film is deposited using ion-assisted electron beam evaporation technique, and the deposited film is characterized using variable angle spectroscopic ellipsometry, UV–Vis–NIR spectrophotometer, coherence correlation interferometer, and Abbe refractometer as well as image processing techniques to investigate its optical and surface properties. The surface quality of the film in terms of average roughness, kurtosis, skewness, and power spectral density (PSD) is analyzed using interferometer and image processing. The refractive index of the SiO₂ film is found to increase from 1.452 to 1.482 at 550 nm with increase in film thickness. This is corroborated by Abbe refractometer findings where the film refractive index is found to be 1.46490 and 1.48226 for a film thickness of 100 and 400 nm, respectively. The SiO₂ film also results in reduction in average surface roughness from 35 nm of the uncoated substrate to 0.15 nm of the coated surface. Statistical indicators of surface quality extract from interferometric images such as kurtosis, skewness, and PSD and also exhibit sharp decline in their respective values of the coated surface as compared to the uncoated substrate indicating improvement in the surface quality after coating.

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Mukesh Kumar, Suman Tewary, Neelam Kumari, Amit Lochan Sharma, and Vinod Karar "Optical characterization of silicon dioxide thin films prepared by ion-assisted electron beam deposition," Optical Engineering 58(6), 065104 (27 June 2019). https://doi.org/10.1117/1.OE.58.6.065104

Received: 26 August 2018; Accepted: 5 June 2019; Published: 27 June 2019

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