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Ahmed Nouh
Technical Martketing Engr at Siemens EDA
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Publications (4)
Proceedings Article | 23 March 2009 Paper
Compute resource management and TAT control in mask data prep
Proceedings Volume 7272, 727216 (2009) https://doi.org/10.1117/12.814236
KEYWORDS: Data centers, Optical proximity correction, Control systems, Resolution enhancement technologies, Solids, Visualization, Optical components, Optical resolution, Optical calibration, Computing systems
Proceedings Article | 17 October 2008 Paper
Compute resource management and turn around time control in mask data prep
Proceedings Volume 7122, 71222O (2008) https://doi.org/10.1117/12.801544
KEYWORDS: Databases, Optical proximity correction, Data centers, Metals, Photomasks, Control systems, Data processing, Resolution enhancement technologies, Optical components, Optical resolution
Proceedings Article | 3 May 2007 Paper
Accelerating physical verification using STPRL: a novel language for test pattern generation
Proceedings Volume 6533, 65331I (2007) https://doi.org/10.1117/12.736545
KEYWORDS: Visualization, Optical proximity correction, Computer programming, Computer programming languages, Very large scale integration, Silicon, Standards development, Photomasks, Lithography
Proceedings Article | 21 March 2007 Paper
More on accelerating physical verification using STPRL: a novel language for test pattern generation
Proceedings Volume 6521, 65211T (2007) https://doi.org/10.1117/12.712389
KEYWORDS: Optical proximity correction, Visualization, Computer programming, Computer programming languages, Very large scale integration, Silicon, Photomasks, Lithography, Neodymium
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