Mr. Akio Misaka Profile

Akio Misaka

at Osaka Metropolitan Univ

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 28 July 2014 Paper

Built-in lens mask lithography: challenge for high definition lens-less lithography

Naoki Ueda, Masaru Sasago, Akio Misaka, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai

Proceedings Volume 9256, 92560A (2014) https://doi.org/10.1117/12.2065251

KEYWORDS: Photomasks, Lithography, Transmittance, Resolution enhancement technologies, Binary data, Geometrical optics, Numerical simulations, Light wave propagation, Collimation, Phase shifts

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Proceedings Article | 31 March 2014 Paper

Built-in lens mask lithography

Naoki Ueda, Masaru Sasago, Akio Misaka, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai

Proceedings Volume 9052, 90520I (2014) https://doi.org/10.1117/12.2046060

KEYWORDS: Photomasks, Lithography, Transmittance, Resolution enhancement technologies, Binary data, Geometrical optics, Optical lithography, Phase shifts, Light wave propagation, Collimation

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Proceedings Article | 23 March 2011 Paper

Mask enhancer technology with source mask optimization (SMO) for 2Xnm-node logic layout gate fabrication

Takashi Matsuda, Shigeo Irie, Tadami Shimizu, Takashi Yuito, Yasuko Tabata, Yuuji Nonami, Akio Misaka, Taichi Koizumi, Masaru Sasago

Proceedings Volume 7973, 797316 (2011) https://doi.org/10.1117/12.878727

KEYWORDS: Photomasks, Source mask optimization, Binary data, Halftones, Logic devices, Lithographic illumination, Phase shifts, Resolution enhancement technologies, Logic, Optical proximity correction

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Proceedings Article | 13 March 2010 Paper

Mask enhancer technology for sub-100nm pitch random logic layout contact hole fabrication

Takashi Yuito, Hiroshi Sakaue, Takashi Matsuda, Tadami Shimizu, Shigeo Irie, Fumio Iwamoto, Akio Misaka, Taichi Koizumi, Masaru Sasago

Proceedings Volume 7640, 76401B (2010) https://doi.org/10.1117/12.848025

KEYWORDS: Photomasks, Printing, Lithography, Image enhancement, Logic, Transmittance, Lab on a chip, Resolution enhancement technologies, Immersion lithography, Phase shifts

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Proceedings Article | 12 May 2005 Paper

Mask enhancer technology for 45-nm node contact hole fabrication

Takashi Yuito, Vincent Wiaux, Lieve Van Look, Geert Vandenberghe, Shigeo Irie, Takahiro Matsuo, Akio Misaka, Hisashi Watanabe, Masaru Sasago

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598977

KEYWORDS: Thin films, Photomasks, Transmittance, Printing, Lithography, Halftones, Semiconducting wafers, Critical dimension metrology, Quartz, Resolution enhancement technologies

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Proceedings Article | 26 June 2003 Paper

Improved outline phase-shifting mask (OL-PSM) for reduction of the mask error enhancement factor

Akio Misaka, Takahiro Matsuo, Masaru Sasago

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485319

KEYWORDS: Photomasks, Resolution enhancement technologies, Phase shifting, Phase shifts, Lithography, Critical dimension metrology, Image enhancement, Optical lithography, Printing, Semiconducting wafers

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Proceedings Article | 26 June 2003 Paper

Novel strong-resolution enhancement technology with phase-shifting mask for logic gate pattern fabrication

Takahiro Matsuo, Akio Misaka, Masaru Sasago

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485363

KEYWORDS: Photomasks, Phase shifts, Lithography, Reticles, Opacity, Critical dimension metrology, Logic devices, Resolution enhancement technologies, Image enhancement, Lithographic illumination

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Proceedings Article | 26 July 1999 Paper

Optical proximity correction considering process latitude

Akio Misaka, Shinji Odanaka

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354379

KEYWORDS: Optical proximity correction, Photomasks, 3D modeling, Lithography, 3D image processing, Computer simulations, Optical lithography, Data processing, Polarization, Critical dimension metrology

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Proceedings Article | 7 July 1997 Paper

Optical proximity correction in DRAM cell using a new statistical methodology

Akio Misaka, Akihiko Goda, Koji Matsuoka, Hiroyuki Umimoto, Shinji Odanaka

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275994

KEYWORDS: Optical proximity correction, Algorithm development, Critical dimension metrology, Photomasks, Lithography, Design for manufacturability, Error analysis, Yield improvement

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