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Akira Fujii
Senior Engineer at Hitachi High-Tech Science Corp
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Publications (4)
Proceedings Article | 11 March 2002 Paper
Technologies for electron-beam reticle writing systems for 130-nm node and below
Genya Matsuoka, Hidetoshi Satoh, Akira Fujii, Kazui Mizuno, Tetsuji Nakahara, Suyo Asai, Yasuhiro Kadowaki, Hajime Shimada, Hiroshi Touda, Ken Iizumi, Hiroyuki Takahashi, Kazuyoshi Oonuki, Toshikazu Kawahara, Katsuhiro Kawasaki, Koji Nagata
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458323
KEYWORDS: Reticles, Critical dimension metrology, Control systems, Electronics, Optical proximity correction, Parallel processing, Analog electronics, Etching, Electron beams
Proceedings Article | 5 September 2001 Paper
Advanced e-beam reticle writing system for next-generation reticle fabrication
Akira Fujii, Kazui Mizuno, Tetsuji Nakahara, Suyo Asai, Yasuhiro Kadowaki, Hajime Shimada, Hiroshi Touda, Ken Iizumi, Hiroyuki Takahashi, Kazuyoshi Oonuki, Toshikazu Kawahara, Katsuhiro Kawasaki, Koji Nagata, H. Satoh
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438405
KEYWORDS: Reticles, Control systems, Critical dimension metrology, Electronics, Parallel processing, Analog electronics, Data conversion, Metrology, Overlay metrology
Proceedings Article | 20 August 2001 Paper
High-resolution and high-stability electromagnetic-deflection control system for EB lithography system
Koji Nagata, Masahide Okumura, Kenji Maio, Akira Fujii, Hisashi Andoh, Toshiyuki Morimura, Hajime Hayakawa
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436692
KEYWORDS: Control systems, Electromagnetism, Electron beam lithography, Resistors, Lithography, Analog electronics, Temperature metrology, Linear filtering, Digital electronics, Device simulation
Proceedings Article | 17 May 1994 Paper
Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography
Masahiro Watanabe, Yoshitada Oshida, Yasuhiko Nakayama, Minoru Yoshida, Ryuichi Funatsu, Akira Fujii, Taku Ninomiya
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175490
KEYWORDS: Semiconducting wafers, Photoresist materials, Wafer-level optics, Control systems, Aluminum, Lithography, Modulation, Interferometry, Optical lithography, Beam splitters
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