Dr. Alan R. Stivers Profile

Dr. Alan R. Stivers

Consultant/Retired

SPIE Involvement:

Author

Publications (30)

Proceedings Article | 18 March 2009 Paper

Paper

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Manish Chandhok, Sanjay Goyal, Steven Carson, Seh-Jin Park, Guojing Zhang, Alan Myers, Michael Leeson, Marilyn Kamna, Fabian Martinez, Alan Stivers, Gian Lorusso, Jan Hermans, Eric Hendrickx, Sanjay Govindjee, Gerd Brandstetter, Tod Laursen

Proceedings Volume 7271, 72710G (2009) https://doi.org/10.1117/12.814428

KEYWORDS: Extreme ultraviolet, Photomasks, Finite element methods, Reticles, Error analysis, Thin films, Photovoltaics, Data modeling, Distortion, Image registration

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Proceedings Article | 17 October 2008 Paper

Paper

Pattern placement correction due to bending in EUVL masks

Seh-Jin Park, Chandhok Manish, Marilyn Kamna, Chuan Hu, Guojing Zhang, Fabian Martinez, Nathan Wilcox, Kamgmin Hsia, Alan Stivers

Proceedings Volume 7122, 71222C (2008) https://doi.org/10.1117/12.801542

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Metrology, Thin films, Personal protective equipment, Distortion, Image registration, Thin film deposition, Extreme ultraviolet, Reticles

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Proceedings Article | 29 May 2007 Paper

Paper

Progress on EUV mask fabrication for 32-nm technology node and beyond

Guojing Zhang, Pei-Yang Yan, Ted Liang, Seh-jin Park, Peter Sanchez, Emily Shu, Erdem Ultanir, Sven Henrichs, Alan Stivers, Gilroy Vandentop, Barry Lieberman, Ping Qu

Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

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Proceedings Article | 20 May 2006 Paper

Paper

EUV mask process development and integration

Guojing Zhang, Pei-Yang Yan, Ted Liang, Yan Du, Peter Sanchez, Seh-jin Park, Eric Lanzendorf, Chang Ju Choi, Emily Shu, Alan Stivers, Jeff Farnsworth, Kangmin Hsia, Manish Chandhok, Michael Leeson, Gilroy Vandentop

Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

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Proceedings Article | 20 May 2006 Paper

Paper

EUV mask pattern defect printability

Ted Liang, Guojing Zhang, Patrick Naulleau, Alan Myers, Seh-Jin Park, Alan Stivers, Gilroy Vandentop

Proceedings Volume 6283, 62830K (2006) https://doi.org/10.1117/12.681844

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Cadmium, Photomicroscopy, Semiconducting wafers, Optical lithography

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Proceedings Article | 9 November 2005 Paper

Paper

On the sensitivity improvement and cross-correlation methodology for confocal EUV mask blank defect inspection tool fleet

Kuen-Yu Tsai, Eric Gullikson, Patrick Kearney, Alan Stivers

Proceedings Volume 5992, 599240 (2005) https://doi.org/10.1117/12.637754

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Confocal microscopy, Signal detection, Optical spheres, Defect detection, Extreme ultraviolet lithography, Defect inspection, Calibration

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Proceedings Article | 8 November 2005 Paper

Paper

Magnetron reactive sputtering of TaN and TaON films for EUV mask applications

Kyung Lee, Malahat Tavassoli, Alan Stivers, Barry Lieberman

Proceedings Volume 5992, 59922B (2005) https://doi.org/10.1117/12.625006

KEYWORDS: Particles, Inspection, Reflectivity, Extreme ultraviolet, Photomasks, Argon, Optical properties, Sputter deposition, Diffractive optical elements, Surface roughness

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Proceedings Article | 10 May 2005 Paper

Paper

Understanding and reduction of defects on finished EUV masks

Ted Liang, Peter Sanchez, Guojing Zhang, Emily Shu, Rajesh Nagpal, Alan Stivers

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.604717

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Deep ultraviolet, Scanning electron microscopy, Atomic force microscopy, Contamination, Defect inspection, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 6 May 2005 Paper

Paper

Modeling the defect inspection sensitivity of a confocal microscope

E. Gullikson, E. Tejnil, K.-Y. Tsai, A. Stivers, H. Kusunose

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600209

KEYWORDS: Optical spheres, Multilayers, Confocal microscopy, Photomasks, Microscopes, Silica, Defect inspection, Light scattering, Inspection, Scattering

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Proceedings Article | 6 December 2004 Paper

Paper

EUV mask pilot line at Intel Corporation

Alan Stivers, Pei-Yang Yan, Guojing Zhang, Ted Liang, Emily Shu, Edita Tejnil, Barry Lieberman, Rajesh Nagpal, Kangmin Hsia, Michael Penn, Fu-Chang Lo

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569176

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Reflectivity, Metrology, Lithography, Optical lithography, Standards development, Mask making

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Proceedings Article | 6 December 2004 Paper

Paper

Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography

Edita Tejnil, Eric Gullikson, Alan Stivers

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569849

KEYWORDS: Inspection, Optical spheres, Silica, Multilayers, Defect detection, Confocal microscopy, Photomasks, Extreme ultraviolet lithography, Surface roughness, Reflectivity

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Proceedings Article | 6 December 2004 Paper

Paper

E-beam mask repair: fundamental capability and applications

Ted Liang, Eric Frendberg, Daniel Bald, Michael Penn, Alan Stivers

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569210

KEYWORDS: Etching, Quartz, Photomasks, Extreme ultraviolet, Chromium, Scanning electron microscopy, Electron beams, Scanning probe microscopy, Ruthenium, Atomic force microscopy

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Proceedings Article | 20 August 2004 Paper

Paper

Demonstration of damage-free mask repair using electron beam-induced processes

Ted Liang, Alan Stivers, Michael Penn, Dan Bald, Chetan Sethi, Volker Boegli, Michael Budach, Klaus Edinger, Petra Spies

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557788

KEYWORDS: Photomasks, Etching, Electron beams, Extreme ultraviolet, Scanning electron microscopy, Ruthenium, Atomic force microscopy, Gases, Chromium, Spatial resolution

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Proceedings Article | 20 May 2004 Paper

Paper

Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Manish Chandhok, Sang Lee, Christof Krautschik, Guojing Zhang, Bryan Rice, Michael Goldstein, Eric Panning, Robert Bristol, Alan Stivers, Melissa Shell

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535995

KEYWORDS: Point spread functions, Modulation transfer functions, Mirrors, Extreme ultraviolet lithography, Critical dimension metrology, Spatial frequencies, Extreme ultraviolet, Optical proximity correction, Fourier transforms, Deep ultraviolet

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Proceedings Article | 20 May 2004 Paper

Paper

EUVL defect printability at the 32-nm node

Eric Gullikson, Edita Tejnil, Ted Liang, Alan Stivers

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.558816

KEYWORDS: Multilayers, Extreme ultraviolet lithography, Photomasks, Coating, Reflectivity, Opacity, Cameras, Semiconducting wafers, Systems modeling, Scattering

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Proceedings Article | 17 December 2003 Paper

Paper

EUV substrate and blank inspection with confocal microscopy

Jan-Peter Urbach, Jan Cavelaars, Hal Kusunose, Ted Liang, Alan Stivers

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518388

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

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Proceedings Article | 27 December 2002 Paper

Paper

Pattern inspection of EUV masks using DUV light

Ted Liang, Edita Tejnil, Alan Stivers

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467298

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Deep ultraviolet, Oxides, Etching, Extreme ultraviolet lithography, Reflectivity, Contamination, Defect inspection

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Proceedings Article | 27 December 2002 Paper

Paper

Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks

Alan Stivers, Ted Liang, Michael Penn, Barry Lieberman, Gilbert Shelden, James Folta, Cindy Larson, Paul Mirkarimi, Christopher Walton, Eric Gulliksong, Moonsuk Yi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468199

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Particles, Gold, Extreme ultraviolet lithography, Semiconducting wafers, Optical spheres, Multilayers

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Proceedings Article | 1 July 2002 Paper

Paper

Damage-free mask repair using electron-beam-induced chemical reactions

Ted Liang, Alan Stivers

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472312

KEYWORDS: Etching, Ions, Photomasks, Gallium, Extreme ultraviolet, Electron beams, Quartz, Atomic force microscopy, Chromium, Platinum

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Proceedings Article | 1 July 2002 Paper

Paper

Inspection of EUV reticles

Donald Pettibone, Andrei Veldman, Ted Liang, Alan Stivers, Pawitter Mangat, Bing Lu, Scott Hector, James Wasson, Kenneth Blaedel, Emily Fisch, David Walker

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472311

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reflectivity, Silicon, Deep ultraviolet, Reticles, Semiconducting wafers, Multilayers, Glasses

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Proceedings Article | 11 March 2002 Paper

Paper

Enhanced optical inspectability of patterned EUVL mask

Ted Liang, Alan Stivers, Pei-yang Yan, Edita Tejnil, Guojing Zhang

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458303

KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet lithography, Photomasks, Deep ultraviolet, Chromium, Image transmission, Optical inspection, Image enhancement, Ruthenium

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Proceedings Article | 11 March 2002 Paper

Paper

Dependence of mask-defect printability and printability criteria on lithography process resolution

Alan Stivers, Edita Tejnil

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458279

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Transistors, Extreme ultraviolet lithography, Cadmium, Image resolution, Optical lithography, Semiconducting wafers, Tolerancing

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Proceedings Article | 22 January 2001 Paper

Paper

UV inspection of EUV and SCALPEL reticles

Donald Pettibone, Noah Bareket, Ted Liang, Alan Stivers, Scott Hector, Pawitter Mangat, Douglas Resnick, Michael Lercel, Mark Lawliss, Christopher Magg, Anthony Novembre, Reginald Farrow

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410699

KEYWORDS: Photomasks, Inspection, Charged-particle lithography, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Silicon, Ultraviolet radiation, Chromium

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Proceedings Article | 21 July 2000 Paper

Paper

EUV mask fabrication with Cr absorber

Pawitter Mangat, Scott Hector, Stewart Rose, Gregory Cardinale, Edita Tejnil, Alan Stivers

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390099

KEYWORDS: Photomasks, Chromium, Etching, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Inspection, Deep ultraviolet, Silicon

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Proceedings Article | 19 July 2000 Paper

Paper

Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks

Edita Tejnil, Alan Stivers, Richard Schenker, Larry Zurbrick

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392038

KEYWORDS: Glasses, Inspection, Etching, Wet etching, Photomasks, Defect inspection, Defect detection, Semiconducting wafers, Optical lithography, Interference (communication)

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Proceedings Article | 19 July 2000 Paper

Paper

EUV mask absorber characterization and selection

Pei-yang Yan, Guojing Zhang, Patrick Kofron, Jeffrey Powers, Mark Tran, Ted Liang, Alan Stivers, Fu-Chang Lo

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392025

KEYWORDS: Etching, Metals, Photomasks, Oxides, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Tantalum, Chromium

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Proceedings Article | 5 July 2000 Paper

Paper

Alt-PSM for 0.10-um and 0.13-um polypatterning

Richard Schenker, Heinrich Kirchauer, Alan Stivers, Edita Tejnil

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388937

KEYWORDS: Photomasks, Phase shifts, Optical lithography, Monochromatic aberrations, Binary data, Overlay metrology, Calibration, Semiconducting wafers, Inspection, Glasses

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Proceedings Article | 30 December 1999 Paper

Paper

Options for at-wavelength inspection of patterned extreme ultraviolet lithography masks

Edita Tejnil, Alan Stivers

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373373

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Defect inspection, Electrons, Sensors, Extreme ultraviolet lithography, Data acquisition, Plasma, Signal detection

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Proceedings Article | 25 June 1999 Paper

Paper

EUV mask patterning approaches

Pei-yang Yan, Guojing Zhang, Patrick Kofron, Jenn Chow, Alan Stivers, Edita Tejnil, Gregory Cardinale, Patrick Kearney

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351102

KEYWORDS: Photomasks, Extreme ultraviolet, Silicon, Metals, Extreme ultraviolet lithography, Optical lithography, Mask making, Reflectivity, Etching, Opacity

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Proceedings Article | 23 April 1999 Paper

Paper

Mask technology for EUV lithography

M. Bujak, Scott Burkhart, Charles Cerjan, Patrick Kearney, Craig Moore, Shon Prisbrey, Donald Sweeney, William Tong, Stephen Vernon, Christopher Walton, Abbie Warrick, Frank Weber, Marco Wedowski, Karl Wilhelmsen, Jeffrey Bokor, Sungho Jeong, Gregory Cardinale, Avijit Ray-Chaudhuri, Alan Stivers, Edita Tejnil, Pei-yang Yan, Scott Hector, Khanh Nguyen

Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346225

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers, Reflectivity, Extreme ultraviolet, Silicon, Inspection, Optical lithography, Ion beams

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Showing 5 of 30 publications

Conference Committee Involvement (2)

Photomask Technology

9 September 2003 | Monterey, California, United States

Photomask Technology

1 October 2002 | Monterey, CA, United States

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