Mr. Alberto D. Dioses Profile

Alberto D. Dioses

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 20 March 2015 Paper

Progress in spin-on metal oxide hardmask materials for filling applications

Huirong Yao, Alberto Dioses, Salem Mullen, Elizabeth Wolfer, Douglas McKenzie, Dalil Rahman, JoonYeon Cho, Munirathna Padmanaban, Claire Petermann, YoungJun Her, Yi Cao

Proceedings Volume 9425, 942518 (2015) https://doi.org/10.1117/12.2085811

KEYWORDS: Metals, Etching, Oxides, Photomasks, Dielectrics, Resistance, Semiconducting wafers, Coating, Silicon, Plasma etching

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Novel spin-on metal hardmask materials for filling applications

Alberto Dioses, Venkata Chada, Elizabeth Wolfer, Edward Ng, Salem Mullen, Huirong Yao, JoonYeon Cho, Munirathna Padmanaban

Proceedings Volume 9051, 90512B (2014) https://doi.org/10.1117/12.2046676

KEYWORDS: Etching, Resistance, Metals, Chemical vapor deposition, Semiconducting wafers, Silicon, Wet etching, Atomic layer deposition, Oxides, Semiconductor manufacturing

Read Abstract +

Proceedings Article | 29 March 2013 Paper

New spin-on metal hardmask materials for lithography processes

Huirong Yao, Salem Mullen, Elizabeth Wolfer, Dalil Rahman, Clement Anyadiegwu, Douglas Mckenzie, Alberto Dioses, Joonyeon Cho, Munirathna Padmanaban

Proceedings Volume 8682, 86820S (2013) https://doi.org/10.1117/12.2011226

KEYWORDS: Etching, Metals, Semiconducting wafers, Photomasks, Silicon, Coating, Oxides, Extreme ultraviolet lithography, Lithography, Photoresist materials

Read Abstract +

Proceedings Article | 31 March 2010 Paper

Process optimization consideration for 193nm developable bottom anti-reflective coatings (DBARCs)

Takanori Kudo, Srinivasan Chakrapani, Alberto Dioses, Edward Ng, Charito Antonio, Deepa Parthasarathy, Richard Collett, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7639, 763928 (2010) https://doi.org/10.1117/12.846313

KEYWORDS: Fourier transforms, Lithography, Silicon, Plasma etching, Plasma, Coating, Polymers, Bottom antireflective coatings, Etching, 193nm lithography

Read Abstract +

Proceedings Article | 11 December 2009 Paper

Latest developments in photosensitive developable bottom anti-reflective coating (DBARC)

Takanori Kudo, Srinivasan Chakrapani, Alberto Dioses, Edward Ng, Charito Antonio, Deepa Parthasarathy, Shinji Miyazaki, Yuki Ubayashi, Kazuma Yamamoto, Yasushi Akiyama, Richard Collett, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7520, 75200N (2009) https://doi.org/10.1117/12.837050

KEYWORDS: Fourier transforms, Polymers, Lithography, Bottom antireflective coatings, Plasma etching, Plasma, Etching, Silicon, Semiconducting wafers, Scanning electron microscopy

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

Francis Houlihan, Alberto Dioses, Takanori Kudo, Meng Li, Lin Zhang, Sumathy Vasanthan, Srinivasan Chakrapani, Deepa Parthasarathy, Charito Antonio, Edward Ng, Ping-Hung Lu, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7273, 727316 (2009) https://doi.org/10.1117/12.816375

KEYWORDS: Prototyping, Polymers, Binary data, Fourier transforms, Bottom antireflective coatings, Arsenic, Plasma etching, Head-mounted displays, Electroluminescence, Coating

Read Abstract +

Proceedings Article | 15 April 2008 Paper

Second-generation radiation sensitive 193-nm developable bottom antireflective coatings (DBARC): recent results

Francis Houlihan, Alberto Dioses, Lin Zhang, Joseph Oberlander, Alexandra Krawicz, Sumathy Vasanthan, Meng Li, Yayi Wei, PingHung Lu, Mark Neisser

Proceedings Volume 6923, 692330 (2008) https://doi.org/10.1117/12.781587

KEYWORDS: Reflectivity, Polymers, Fourier transforms, Bottom antireflective coatings, Plasma etching, Coating, Silicon, Reticles, Plasma, Prototyping

Read Abstract +

Proceedings Article | 2 April 2007 Paper

Second-generation radiation sensitive developable bottom anti-reflective coatings (DBARC) and implant resists approaches for 193-nm lithography

Francis Houlihan, Alberto Dioses, Medhat Toukhy, Andrew Romano, Joseph Oberlander, HengPeng Wu, Salem Mullen, Alexandra Krawicz, PingHung Lu, Mark Neisser

Proceedings Volume 6519, 65190L (2007) https://doi.org/10.1117/12.713436

KEYWORDS: Arsenic, Resistance, Fluorine, Polymers, Prototyping, Lithography, Photoresist processing, Semiconducting wafers, Fourier transforms, Bottom antireflective coatings

Read Abstract +

Proceedings Article | 2 April 2007 Paper

Spin-on trilayer approaches to high NA 193nm lithography

D. Abdallah, D. McKenzie, A. Timko, A. Dioses, F. Houlihan, D. Rahman, S. Miyazaki, R. Zhang, W. Kim, H. Wu, L. Pylneva, P.-H. Lu, M. Neisser, R. Dammel, J. Biafore

Proceedings Volume 6519, 65190M (2007) https://doi.org/10.1117/12.712700

KEYWORDS: Silicon, Etching, Fourier transforms, Carbon, Lithography, Antireflective coatings, Reflectivity, Semiconducting wafers, Photomasks, Silicon carbide

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years